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Lithography-induced hydrophobic surfaces of silicon wafers with excellent anisotropic wetting properties
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Zhu, Jiajing, Tian, Yanling, Liu, Xianping and Yang, Chengjuan (2019) Lithography-induced hydrophobic surfaces of silicon wafers with excellent anisotropic wetting properties. Microsystem Technologies, 25 . pp. 735-745. doi:10.1007/s00542-018-4010-3 ISSN 0946-7076.
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WRAP-lithography-induced-hydrophobic-surfaces-silicon-wafers-excellent-anisotropic-Zhu-2018.pdf - Accepted Version - Requires a PDF viewer. Download (1357Kb) | Preview |
Official URL: http://dx.doi.org/10.1007/s00542-018-4010-3
Abstract
In recent years, hydrophobic surfaces have attracted more and more attentions from many researchers. In this paper, we comprehensively discussed the effects of specific parameters of microstructures on the wetting properties by using the theoretical models, the effects of microstructures on two-dimensional anisotropic properties and the water droplet impact experiment. Firstly, the relationships between the CAs and variable parameters were explored after the formula derivation for three various patterns. Then three different patterns were fabricated successfully on the silicon wafers by lithography technology and the effects of microstructures (including LWD parameters and interval parameters) on surface wettability were studied based on the theoretical research. After that, the effects of microstructures on two-dimensional anisotropic properties were also studied. Finally, the water droplet impact experiment was carried out and the viscoelastic properties were simply investigated. Our research proposed a potential method for fabricating hydrophobic surfaces with excellent anisotropic properties. This method may be widely used in a variety of academic and industrial applications in the future.
Item Type: | Journal Article | ||||||||||||||||||||||||
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Subjects: | Q Science > QD Chemistry | ||||||||||||||||||||||||
Divisions: | Faculty of Science, Engineering and Medicine > Engineering > Engineering | ||||||||||||||||||||||||
Library of Congress Subject Headings (LCSH): | Hydrophobic surfaces, Lithography, Anisotropy, Viscoelasticity | ||||||||||||||||||||||||
Journal or Publication Title: | Microsystem Technologies | ||||||||||||||||||||||||
Publisher: | Springer Berlin Heidelberg | ||||||||||||||||||||||||
ISSN: | 0946-7076 | ||||||||||||||||||||||||
Official Date: | 4 February 2019 | ||||||||||||||||||||||||
Dates: |
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Volume: | 25 | ||||||||||||||||||||||||
Page Range: | pp. 735-745 | ||||||||||||||||||||||||
DOI: | 10.1007/s00542-018-4010-3 | ||||||||||||||||||||||||
Status: | Peer Reviewed | ||||||||||||||||||||||||
Publication Status: | Published | ||||||||||||||||||||||||
Reuse Statement (publisher, data, author rights): | This is a post-peer-review, pre-copyedit version of an article published in Microsystem Technologies. The final authenticated version is available online at: http://dx.doi.org/10.1007/s00542-018-4010-3 | ||||||||||||||||||||||||
Access rights to Published version: | Restricted or Subscription Access | ||||||||||||||||||||||||
Date of first compliant deposit: | 21 September 2018 | ||||||||||||||||||||||||
Date of first compliant Open Access: | 30 June 2019 | ||||||||||||||||||||||||
RIOXX Funder/Project Grant: |
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