A NIXSW structural investigation of the low temperature silyl phase formed by SiH4 reaction with Cu(111)
UNSPECIFIED (2002) A NIXSW structural investigation of the low temperature silyl phase formed by SiH4 reaction with Cu(111). CHEMICAL PHYSICS LETTERS, 351 (3-4). pp. 208-212. ISSN 0009-2614Full text not available from this repository.
The structure of the Cu(111)-(3x3)-SiHx surface formed by reaction of silane (SiH4) with Cu(111) at 140 K, has been determined using normal incidence X-ray standing wave (NIXSW) analysis. The (3 x 3) phase, thought to comprise a mixture of SiH3 (2/9 ML) and SiH or Si species (1/9 ML), has all the surface silicon atoms located in hcp 3-fold hollow sites at a distance of 1.98+/-0.04 Angstrom from the surface copper scatterer planes. (C) 2002 Published by Elsevier Science B.V.
|Item Type:||Journal Article|
|Subjects:||Q Science > QD Chemistry
Q Science > QC Physics
|Journal or Publication Title:||CHEMICAL PHYSICS LETTERS|
|Publisher:||ELSEVIER SCIENCE BV|
|Date:||10 January 2002|
|Number of Pages:||5|
|Page Range:||pp. 208-212|
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