UNSPECIFIED (2001) Antimony and boron diffusion in SiGe and Si under the influence of injected point defects. In: 3rd International Conference on Materials in Microelectronics, OCT 16-17, 2000, DUBLIN, IRELAND.

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Abstract

The diffusion of Sb and B in both Si and SiGe is studied in this work. Injection of both interstitial- and vacancy-type point defects using rapid thermal annealing (RTA) in both NH3 and O-2 atmospheres is calibrated for Sb diffusion in Si, before examining Sb diffusion in SiGe and B diffusion in Si and SiGe. Measurement of the diffusion retardation or enhancement under defect injection conditions will elucidate the diffusion mechanism and allow determination of the diffusivity, necessary for modeling of device fabrication processes. These experiments confirm the predominant mechanism for diffusion of Sb in Si and SiGe to be vacancy-mediated, while the predominant mechanism for B appears to be interstitial-mediated in Si and SiGe. The diffusivity values measured for B in Si and SiGe are reported. (C) 2001 Kluwer Academic Publishers.

Item Type:	Conference Item (UNSPECIFIED)
Subjects:	T Technology > TK Electrical engineering. Electronics Nuclear engineering T Technology > TA Engineering (General). Civil engineering (General) Q Science > QC Physics
Journal or Publication Title:	JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Publisher:	KLUWER ACADEMIC PUBL
ISSN:	0957-4522
Date:	June 2001
Volume:	12
Number:	4-6
Number of Pages:	3
Page Range:	pp. 219-221
Publication Status:	Published
Title of Event:	3rd International Conference on Materials in Microelectronics
Location of Event:	DUBLIN, IRELAND
Date(s) of Event:	OCT 16-17, 2000
URI:	http://wrap.warwick.ac.uk/id/eprint/11991

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