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Improved interface and electrical properties of atomic layer deposited Al2O3 / 4H-SiC
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Suvanam, Sethu Saveda, Usman, Muhammed, Martin, David, Yazdi, Milad. G., Linnarsson, Margareta, Tempez, Agnès, Götelid, Mats and Hallén, Anders (2018) Improved interface and electrical properties of atomic layer deposited Al2O3 / 4H-SiC. Applied Surface Science, 433 . pp. 108-115. doi:10.1016/j.apsusc.2017.10.006 ISSN 0169-4332.
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Official URL: http://dx.doi.org/10.1016/j.apsusc.2017.10.006
Item Type: | Journal Article | ||||||
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Divisions: | Faculty of Science, Engineering and Medicine > Engineering > Engineering | ||||||
Journal or Publication Title: | Applied Surface Science | ||||||
Publisher: | Elsevier BV | ||||||
ISSN: | 0169-4332 | ||||||
Official Date: | 1 March 2018 | ||||||
Dates: |
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Volume: | 433 | ||||||
Page Range: | pp. 108-115 | ||||||
DOI: | 10.1016/j.apsusc.2017.10.006 | ||||||
Status: | Peer Reviewed | ||||||
Publication Status: | Published | ||||||
Access rights to Published version: | Restricted or Subscription Access |
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