Two dimensional profiling of ultra-shallow implants using SIMS
UNSPECIFIED (1998) Two dimensional profiling of ultra-shallow implants using SIMS. In: International Conference on Characterization and Metrology for ULSI Technology, MAR, 1998, GAITHERSBURG, MD.Full text not available from this repository.
The lateral spread of dopant under the implant mask edge and its behaviour during thermal processing is becoming increasingly important as device dimensions are reduced. Direct measurement of the distribution by high spatial resolution SIMS is not possible owing to the very few impurity atoms present in the analyte volume at junction concentrations. In this paper we describe a SIMS based technique, using a special sample structure, that may be used to access this information and discuss the instrumental requirements, resolution and detection limits, as well as presenting cross sectional dopant data.
|Item Type:||Conference Item (UNSPECIFIED)|
|Subjects:||Q Science > QC Physics|
|Series Name:||AIP CONFERENCE PROCEEDINGS|
|Journal or Publication Title:||CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY|
|Publisher:||AMER INST PHYSICS|
|Editor:||Seiler, DG and Diebold, AC and Bullis, WM and Shaffner, TJ and McDonald, R and Walters, EJ|
|Number of Pages:||5|
|Page Range:||pp. 766-770|
|Title of Event:||International Conference on Characterization and Metrology for ULSI Technology|
|Location of Event:||GAITHERSBURG, MD|
|Date(s) of Event:||MAR, 1998|
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