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Energy loss rates of two dimensional hole gases in gated Si/Si0.8Ge0.2 heterostructures

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UNSPECIFIED (1999) Energy loss rates of two dimensional hole gases in gated Si/Si0.8Ge0.2 heterostructures. In: 1st International Workshop on Lattice-Mismatched and Heterovalent Thin Film Epitaxy, SEP 13-15, 1998, CASTELVECCHIO PAS, ITALY.

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Abstract

Using high electric field Shubnikov de Haas oscillations (SdH) we have investigated the energy loss rate as a function of carrier temperature of hot holes in the ungated and gated inverted p type modulation doped Si/Si0.8Ge0.2 grown by solid source MBE at lattice temperature of 0.34K. At T-C=0.34 to 1.8K, it is seen that the energy loss rate in such a structure is more than that of a normal structure at the same sheet density, N-h. It is shown that the energy relaxation of the 2DHG is dominated by acoustic phonon scattering via deformation potential coupling.

Item Type: Conference Item (UNSPECIFIED)
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Journal or Publication Title: LATTICE MISMATCHED THIN FILMS
Publisher: MINERALS, METALS & MATERIALS SOC
ISBN: 0-87339-444-5
Editor: Fitzgerald, EA
Date: 1999
Number of Pages: 6
Page Range: pp. 33-38
Publication Status: Published
Title of Event: 1st International Workshop on Lattice-Mismatched and Heterovalent Thin Film Epitaxy
Location of Event: CASTELVECCHIO PAS, ITALY
Date(s) of Event: SEP 13-15, 1998
URI: http://wrap.warwick.ac.uk/id/eprint/13898

Data sourced from Thomson Reuters' Web of Knowledge

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