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Data for Atomic level termination for passivation and functionalisation of silicon surfaces
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Grant, Nicholas E., Pointon, Alex I., Jefferies, Richard, Hiller, Daniel, Han, Yisong, Beanland, Richard, Walker, Marc and Murphy, John D. (2020) Data for Atomic level termination for passivation and functionalisation of silicon surfaces. [Dataset]
Microsoft Excel (Raw data)
Dataset.xlsx - Published Version Available under License Creative Commons Attribution 4.0. Download (113Kb) |
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Plain Text (Readme file)
readme (4).txt - Published Version Available under License Creative Commons Attribution 4.0. Download (631b) |
Abstract
Chemical treatments play an essential role in the formation of high quality interfaces between materials, including in semiconductor devices, and in the functionalisation of surfaces. We have investigated the effects of hydrogen and fluorine termination of (100)-orientation silicon surfaces over a range of length scales. At the centimetre scale, lifetime measurements show clean silicon surfaces can be temporarily passivated by a short treatment in both HF(2%) : HCl(2%) and HF(50%) solutions. The lifetime, and hence surface passivation, becomes better with immersion time in the former, and worse with immersion time in the latter. At the nanometre scale, X-ray photoelectron spectroscopy and atomic force microscopy show treatment with strong HF solutions results in a roughened fluorine-terminated surface. Subsequent superacid-derived surface passivation on different chemically treated surfaces shows considerably better passivation on surfaces treated with HF(2%) : HCl(2%) compared to HF. Lifetime data are modelled to understand the termination in terms of chemical and field effect passivation at the centimetre scale. Surfaces passivated with Al2O3 grown by atomic layer deposition behave similarly when either HF(2%) : HCl(2%) or HF(50%) are used as a pre-treatment, possibly because of the thin silicon dioxide interlayer which subsequently forms. Our study highlights that chemical pre-treatments can be extremely important in the creation of high quality functionalised surfaces.
Item Type: | Dataset | ||||||||||||
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Subjects: | Q Science > QC Physics Q Science > QD Chemistry |
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Divisions: | Faculty of Science, Engineering and Medicine > Engineering > Engineering | ||||||||||||
Type of Data: | Experimental data | ||||||||||||
Library of Congress Subject Headings (LCSH): | Silicon -- Surfaces, Atomic layer deposition, X-ray photoelectron spectroscopy, Atomic force microscopy | ||||||||||||
Publisher: | University of Warwick, School of Engineering | ||||||||||||
Official Date: | 20 July 2020 | ||||||||||||
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Status: | Not Peer Reviewed | ||||||||||||
Publication Status: | Published | ||||||||||||
Media of Output (format): | .xlsx | ||||||||||||
Access rights to Published version: | Open Access (Creative Commons) | ||||||||||||
Copyright Holders: | University of Warwick | ||||||||||||
Description: | Data record consists of an excel spreadsheet containing the raw data and an accompanying readme file. Captions to the figures are given in the paper. Abbreviations, variables and methods used are defined in the paper. |
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Date of first compliant deposit: | 20 July 2020 | ||||||||||||
Date of first compliant Open Access: | 20 July 2020 | ||||||||||||
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