Growth and characterisation of shape memory alloy thin films for micropositioning and microactuation
UNSPECIFIED (1998) Growth and characterisation of shape memory alloy thin films for micropositioning and microactuation. In: SPIE Conference on Micromachining and Microfabrication Process Technology IV, SANTA CLARA, CA, SEP 21-22, 1998. Published in: MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY IV, 3511 pp. 174-182.Full text not available from this repository.
We have investigated the growth of TiNi shape memory alloy thin films at relatively low temperatures (below 150 degrees C) by an ion beam sputter deposition process which is compatible with integrated circuit microfabrication technology. Films of thickness < 5 mu m have been deposited onto various substrates including silicon, glass and Kapton and generally exhibit shape memory characteristics without requiring high temperature annealing. Films covering areas up to 5 cm(2) have been grown and also TiNi microstructures having a range of minimum lateral dimensions down to similar to 100 mu m have been fabricated. Temperature-time profiles measured during direct electrical Joule heating have been used to derive thermal parameters and monitor phase changes indicative of the two-way shape memory effect. The implications for speed of response by scaling shape memory alloy structures to micrometre dimensions are considered.
|Item Type:||Conference Item (UNSPECIFIED)|
|Subjects:||Q Science > QC Physics|
|Series Name:||PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE)|
|Journal or Publication Title:||MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY IV|
|Publisher:||SPIE-INT SOC OPTICAL ENGINEERING|
|Number of Pages:||9|
|Page Range:||pp. 174-182|
|Title of Event:||SPIE Conference on Micromachining and Microfabrication Process Technology IV|
|Location of Event:||SANTA CLARA, CA|
|Date(s) of Event:||SEP 21-22, 1998|
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