UNSPECIFIED (1998) Growth and characterisation of shape memory alloy thin films for micropositioning and microactuation. In: SPIE Conference on Micromachining and Microfabrication Process Technology IV, SEP 21-22, 1998, SANTA CLARA, CA.

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Abstract

We have investigated the growth of TiNi shape memory alloy thin films at relatively low temperatures (below 150 degrees C) by an ion beam sputter deposition process which is compatible with integrated circuit microfabrication technology. Films of thickness < 5 mu m have been deposited onto various substrates including silicon, glass and Kapton and generally exhibit shape memory characteristics without requiring high temperature annealing. Films covering areas up to 5 cm(2) have been grown and also TiNi microstructures having a range of minimum lateral dimensions down to similar to 100 mu m have been fabricated. Temperature-time profiles measured during direct electrical Joule heating have been used to derive thermal parameters and monitor phase changes indicative of the two-way shape memory effect. The implications for speed of response by scaling shape memory alloy structures to micrometre dimensions are considered.

Item Type:	Conference Item (UNSPECIFIED)
Subjects:	Q Science > QC Physics
Series Name:	PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE)
Journal or Publication Title:	MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY IV
Publisher:	SPIE-INT SOC OPTICAL ENGINEERING
ISBN:	0-8194-2970-8
ISSN:	0277-786X
Editor:	Smith, JH
Date:	1998
Volume:	3511
Number of Pages:	9
Page Range:	pp. 174-182
Publication Status:	Published
Title of Event:	SPIE Conference on Micromachining and Microfabrication Process Technology IV
Location of Event:	SANTA CLARA, CA
Date(s) of Event:	SEP 21-22, 1998
URI:	http://wrap.warwick.ac.uk/id/eprint/15043

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