Mameli, Alfredo, Kuang, Yinghuan, Aghaee, Morteza, Ande, Chaitanya K., Karasulu, Bora, Creatore, Mariadriana, Mackus, Adriaan J. M., Kessels, Wilhelmus M. M. and Roozeboom, Fred (2017) Area-selective atomic layer deposition of In2O3 : H using a μ-plasma printer for local area activation. Chemistry of Materials, 29 (3). pp. 921-925. doi:10.1021/acs.chemmater.6b04469 ISSN 0897-4756.

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Item Type:	Journal Article
Subjects:	Q Science > QD Chemistry T Technology > TA Engineering (General). Civil engineering (General) T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions:	Faculty of Science, Engineering and Medicine > Science > Chemistry
Library of Congress Subject Headings (LCSH):	Atomic layer deposition , Lithography, Electron beam , Density functionals , Nanophotonics
Journal or Publication Title:	Chemistry of Materials
Publisher:	American Chemical Society
ISSN:	0897-4756
Official Date:	14 February 2017
Dates:	Date Event 14 February 2017 Published 31 January 2017 Available UNSPECIFIED Accepted
Volume:	29
Number:	3
Page Range:	pp. 921-925
DOI:	10.1021/acs.chemmater.6b04469
Status:	Peer Reviewed
Publication Status:	Published
Access rights to Published version:	Open Access (Creative Commons)
Date of first compliant deposit:	21 June 2021
Date of first compliant Open Access:	22 June 2021
RIOXX Funder/Project Grant:	Project/Grant ID RIOXX Funder Name Funder ID UNSPECIFIED Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek UNSPECIFIED

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