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(Invited) area-selective atomic layer deposition : role of surface chemistry
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Mameli, Alfredo, Karasulu, Bora, Verheijen, Marcel A., Mackus, Adriaan J.M., Kessels, W. M. M. and Roozeboom, Fred (2017) (Invited) area-selective atomic layer deposition : role of surface chemistry. ECS Transactions, 80 (3). pp. 39-48. doi:10.1149/08003.0039ecst ISSN 1938-5862.
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Official URL: http://dx.doi.org/10.1149/08003.0039ecst
Abstract
Area-selective atomic layer deposition is being considered as the next paradigm shift in device fabrication. Besides semiconductor manufacturing, area-selective ALD presents unique opportunities in catalysis and large-area electronics applications. In this contribution, the results of recently developed area-selective ALD processes for In2O3 and ZnO are revisited. These approaches rely on substrate-dependent nucleation that originates from chemoselective precursor adsorption. Here, we focus on the role of thermodynamics and kinetics of the surface reactions in enabling area-selective deposition. Thermodynamics and kinetics of reactions were calculated by density functional theory (DFT) methods. We believe that our findings can be valuable in understanding area-selective ALD processes at a molecular level, the mechanisms underpinning the chemoselective adsorption and thus in advancing the field.
Item Type: | Journal Article | ||||
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Divisions: | Faculty of Science, Engineering and Medicine > Science > Chemistry | ||||
Journal or Publication Title: | ECS Transactions | ||||
Publisher: | IOP | ||||
ISSN: | 1938-5862 | ||||
Official Date: | 2017 | ||||
Dates: |
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Volume: | 80 | ||||
Number: | 3 | ||||
Page Range: | pp. 39-48 | ||||
DOI: | 10.1149/08003.0039ecst | ||||
Status: | Peer Reviewed | ||||
Publication Status: | Published | ||||
Access rights to Published version: | Restricted or Subscription Access |
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