UNSPECIFIED (1998) Surface damage assessment of nanometre finish substrates using differential reflectance spectroscopy. In: 5th Joint Tokyo/Warwick Biennial Nanotechnology Symposium, SCI UNIV TOKYO, NODA CAMPUS, TOKYO, JAPAN, SEP 03-05, 1997. Published in: NANOTECHNOLOGY, 9 (2). pp. 54-60.

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Abstract

Differential reflectance spectroscopy (DRS) is a comparative technique that measures the normalized difference in reflectivity between samples in the UV to near IR region of the spectrum. We apply the technique to gallium arsenide substrates that have undergone different processing treatment. Spectral features are observed that can be assigned to critical point energies of the band structure. It is suggested that these features arise from strain in the crystal lattice and that DRS is a possible candidate for monitoring process-induced damage in substrate preparation.

Item Type:	Conference Item (UNSPECIFIED)
Subjects:	T Technology > TA Engineering (General). Civil engineering (General) T Technology Q Science > QC Physics
Journal or Publication Title:	NANOTECHNOLOGY
Publisher:	IOP PUBLISHING LTD
ISSN:	0957-4484
Date:	June 1998
Volume:	9
Number:	2
Number of Pages:	7
Page Range:	pp. 54-60
Publication Status:	Published
Title of Event:	5th Joint Tokyo/Warwick Biennial Nanotechnology Symposium
Location of Event:	SCI UNIV TOKYO, NODA CAMPUS, TOKYO, JAPAN
Date(s) of Event:	SEP 03-05, 1997
URI:	http://wrap.warwick.ac.uk/id/eprint/15583

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