Surface damage assessment of nanometre finish substrates using differential reflectance spectroscopy
UNSPECIFIED (1998) Surface damage assessment of nanometre finish substrates using differential reflectance spectroscopy. In: 5th Joint Tokyo/Warwick Biennial Nanotechnology Symposium, SCI UNIV TOKYO, NODA CAMPUS, TOKYO, JAPAN, SEP 03-05, 1997. Published in: NANOTECHNOLOGY, 9 (2). pp. 54-60.Full text not available from this repository.
Differential reflectance spectroscopy (DRS) is a comparative technique that measures the normalized difference in reflectivity between samples in the UV to near IR region of the spectrum. We apply the technique to gallium arsenide substrates that have undergone different processing treatment. Spectral features are observed that can be assigned to critical point energies of the band structure. It is suggested that these features arise from strain in the crystal lattice and that DRS is a possible candidate for monitoring process-induced damage in substrate preparation.
|Item Type:||Conference Item (UNSPECIFIED)|
|Subjects:||T Technology > TA Engineering (General). Civil engineering (General)
Q Science > QC Physics
|Journal or Publication Title:||NANOTECHNOLOGY|
|Publisher:||IOP PUBLISHING LTD|
|Official Date:||June 1998|
|Number of Pages:||7|
|Page Range:||pp. 54-60|
|Title of Event:||5th Joint Tokyo/Warwick Biennial Nanotechnology Symposium|
|Location of Event:||SCI UNIV TOKYO, NODA CAMPUS, TOKYO, JAPAN|
|Date(s) of Event:||SEP 03-05, 1997|
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