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Fabrication of TiNi shape memory alloy microactuators by ion beam sputter deposition
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UNSPECIFIED (1998) Fabrication of TiNi shape memory alloy microactuators by ion beam sputter deposition. In: 5th Joint Tokyo/Warwick Biennial Nanotechnology Symposium, SCI UNIV TOKYO, NODA CAMPUS, TOKYO, JAPAN, SEP 03-05, 1997. Published in: NANOTECHNOLOGY, 9 (2). pp. 67-71. ISSN 0957-4484.
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Abstract
We report on the production of thin films of TiNi shape memory alloy, grown by ion beam sputter deposition (IBSD) using a Kaufman-type source, for microactuator applications. IBSD is a vacuum-coating process in which a target is bombarded by accelerated ions from a showered ion beam source and sputtered atoms of the target material are deposited onto a nearby substrate. In this work, argon ions at energies up to 1500 eV and current densities of similar to 1 mA cm(-2) are used to bombard sectored targets of titanium and nickel in order to deposit TiNi films onto unheated substrates. The films were characterized by electrical resistivity measurements and x-ray reflectometry. R-phase and martensitic transformations are seen without high-temperature annealing and the shape memory properties are compared with those of films prepared by DC and RF magnetron sputtering.
| Item Type: | Conference Item (UNSPECIFIED) | ||||
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| Subjects: | T Technology > TA Engineering (General). Civil engineering (General) T Technology Q Science > QC Physics |
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| Journal or Publication Title: | NANOTECHNOLOGY | ||||
| Publisher: | IOP PUBLISHING LTD | ||||
| ISSN: | 0957-4484 | ||||
| Official Date: | June 1998 | ||||
| Dates: |
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| Volume: | 9 | ||||
| Number: | 2 | ||||
| Number of Pages: | 5 | ||||
| Page Range: | pp. 67-71 | ||||
| Publication Status: | Published | ||||
| Title of Event: | 5th Joint Tokyo/Warwick Biennial Nanotechnology Symposium | ||||
| Location of Event: | SCI UNIV TOKYO, NODA CAMPUS, TOKYO, JAPAN | ||||
| Date(s) of Event: | SEP 03-05, 1997 |
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