Applications of x-ray interferometer-generated Moire patterns
UNSPECIFIED (1998) Applications of x-ray interferometer-generated Moire patterns. In: 5th Joint Tokyo/Warwick Biennial Nanotechnology Symposium, SCI UNIV TOKYO, NODA CAMPUS, TOKYO, JAPAN, SEP 03-05, 1997. Published in: NANOTECHNOLOGY, 9 (2). pp. 125-132.Full text not available from this repository.
A monolithic x-ray interferometer has been developed which provides a means of producing high-quality x-ray Moire fringes with readily controlled pitch (spacing). It was designed as a calibrator of sub-microradian angular displacements and it has successfully demonstrated the feasibility of the approach. The quality of its output, when combined with the phase imaging capabilities of interferometry and the latest generation of fringe analysis algorithms, suggests additional, novel applications. This paper first reviews the principles and performance of the system as an angular calibrator and then discusses the potential of x-ray Moire patterns in the form of an x-ray microscope and as a diagnostic tool for ultra-precision metrology. Demonstration results are given mostly in the form of images of fringe fields, since the point here is the production of original data suitable for processing by existing techniques.
|Item Type:||Conference Item (UNSPECIFIED)|
|Subjects:||T Technology > TA Engineering (General). Civil engineering (General)
Q Science > QC Physics
|Journal or Publication Title:||NANOTECHNOLOGY|
|Publisher:||IOP PUBLISHING LTD|
|Number of Pages:||8|
|Page Range:||pp. 125-132|
|Title of Event:||5th Joint Tokyo/Warwick Biennial Nanotechnology Symposium|
|Location of Event:||SCI UNIV TOKYO, NODA CAMPUS, TOKYO, JAPAN|
|Date(s) of Event:||SEP 03-05, 1997|
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