UNSPECIFIED (1998) Applications of x-ray interferometer-generated Moire patterns. In: 5th Joint Tokyo/Warwick Biennial Nanotechnology Symposium, SEP 03-05, 1997, SCI UNIV TOKYO, NODA CAMPUS, TOKYO, JAPAN.

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Abstract

A monolithic x-ray interferometer has been developed which provides a means of producing high-quality x-ray Moire fringes with readily controlled pitch (spacing). It was designed as a calibrator of sub-microradian angular displacements and it has successfully demonstrated the feasibility of the approach. The quality of its output, when combined with the phase imaging capabilities of interferometry and the latest generation of fringe analysis algorithms, suggests additional, novel applications. This paper first reviews the principles and performance of the system as an angular calibrator and then discusses the potential of x-ray Moire patterns in the form of an x-ray microscope and as a diagnostic tool for ultra-precision metrology. Demonstration results are given mostly in the form of images of fringe fields, since the point here is the production of original data suitable for processing by existing techniques.

Item Type:	Conference Item (UNSPECIFIED)
Subjects:	T Technology > TA Engineering (General). Civil engineering (General) T Technology Q Science > QC Physics
Journal or Publication Title:	NANOTECHNOLOGY
Publisher:	IOP PUBLISHING LTD
ISSN:	0957-4484
Date:	June 1998
Volume:	9
Number:	2
Number of Pages:	8
Page Range:	pp. 125-132
Publication Status:	Published
Title of Event:	5th Joint Tokyo/Warwick Biennial Nanotechnology Symposium
Location of Event:	SCI UNIV TOKYO, NODA CAMPUS, TOKYO, JAPAN
Date(s) of Event:	SEP 03-05, 1997
URI:	http://wrap.warwick.ac.uk/id/eprint/15586

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