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Data for Enhanced surface passivation of sub-nanometer silicon dioxide films by superacidic treatments

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Grant, Nicholas E., Pain, Sophie, White, Joshua T., Walker, Marc, Prokes, Ivan and Murphy, John D. (2022) Data for Enhanced surface passivation of sub-nanometer silicon dioxide films by superacidic treatments. [Dataset]

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Official URL: http://wrap.warwick.ac.uk/161183/

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Abstract

Subnanometer-scale silicon dioxide (SiO2) films are frequently present before, during, and after silicon device processing, yet they offer minimal surface passivation and can detrimentally impact subsequent processing steps. Here we develop a process whereby the surface passivation of nanometer and subnanometer SiO2 films is enhanced by up to 2 orders of magnitude by a simple room temperature treatment using the superacid bis(trifluoromethane)sulfonimide (TFSA, sometimes TFSI). By accurately modeling the effective lifetime curves corresponding to the superacid treated SiO2 samples, we have determined that the enhanced passivation is mainly due to a reduction in the interface defect density (Dit) at the Si/SiO2 interface, with a minor contribution also arising from the presence of negative charge. X-ray photoelectron spectroscopy of the treated SiO2 films reveals the presence of fluorine, and this, along with hydrogen, is a strong candidate for the chemical passivation of defects at the Si/SiO2 interface. Post treatment, the SiO2 films show short time scale electronic instability, whereby a degradation and then recovery are observed over a period of 1–10 h which is attributed to variations in the Dit, as determined from our analysis of the injection-dependent lifetime data. Following the instability period, the surface passivation remains relatively stable for days. Nuclear magnetic resonance measurements of superacid-based solutions reveal that electron-donating solvents should be avoided, as they exacerbate surface passivation instabilities. The results presented demonstrate that simple strategies can be used to enhance the passivation properties of ultrathin films greatly, which in the age of nanotechnology could offer benefits to device performance in a range of applications including solar cells and batteries.

Item Type: Dataset
Subjects: Q Science > QC Physics
Q Science > QD Chemistry
T Technology > TA Engineering (General). Civil engineering (General)
T Technology > TN Mining engineering. Metallurgy
Divisions: Faculty of Science, Engineering and Medicine > Engineering > Engineering
Library of Congress Subject Headings (LCSH): Nanostructured materials -- Design and construction, Silica, Superacids, Thin films
Publisher: University of Warwick, School of Engineering
Official Date: 28 June 2022
Dates:
DateEvent
28 June 2022Published
28 June 2022Available
15 December 2021Created
Status: Not Peer Reviewed
Publication Status: Published
Media of Output (format): .xlsx
Access rights to Published version: Open Access
Copyright Holders: University of Warwick
Description:

The dataset (a single file in XLSX format) contains the data behind the figures in the paper. Captions to the figures are given in the paper. Abbreviations, variables and methods used are defined in the paper.

RIOXX Funder/Project Grant:
Project/Grant IDRIOXX Funder NameFunder ID
EP/M024911/1[EPSRC] Engineering and Physical Sciences Research Councilhttp://dx.doi.org/10.13039/501100000266
EP/R511808/1[EPSRC] Engineering and Physical Sciences Research Councilhttp://dx.doi.org/10.13039/501100000266
EP/V037749/1[EPSRC] Engineering and Physical Sciences Research Councilhttp://dx.doi.org/10.13039/501100000266
EP/R513374/1[EPSRC] Engineering and Physical Sciences Research Councilhttp://dx.doi.org/10.13039/501100000266
EP/L015307/1[EPSRC] Engineering and Physical Sciences Research Councilhttp://dx.doi.org/10.13039/501100000266
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Contributors:
ContributionNameContributor ID
DepositorGrant, Nicholas E.73272

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