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Lateral n–i–p junction characterization using laser microscopy

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Muscat, S, Nash, G R, Hall, Ralph, Smith, S J, Bartlett, C J, Nash, K J, Jefferson, J H, Buckle, L, Emeny, M T and Ashley, T (2005) Lateral n–i–p junction characterization using laser microscopy. Semiconductor Science and Technology, 20 (5). pp. 406-411. doi:10.1088/0268-1242/20/5/014

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Official URL: http://dx.doi.org/10.1088/0268-1242/20/5/014

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Abstract

Scanning laser microscopy was used to characterize a lateral n–i–p junction formed in an InSb quantum well. Two-dimensional scans of photocurrent, measured at 77 K under illumination from either a 633 nm or 3.4 µm laser beam, showed a peak in the signal amplitude, confirming the existence of a junction close to the design position. The spatial extent of the peak amplitude signal was different with the different illumination, suggesting that the junction is located within the InSb quantum well.

Item Type: Journal Article
Divisions: Faculty of Science > Physics
Journal or Publication Title: Semiconductor Science and Technology
Publisher: Institute of Physics Publishing Ltd.
ISSN: 0268-1242
Official Date: May 2005
Dates:
DateEvent
May 2005Published
4 March 2005Available
Volume: 20
Number: 5
Page Range: pp. 406-411
DOI: 10.1088/0268-1242/20/5/014
Status: Peer Reviewed
Publication Status: Published
Access rights to Published version: Restricted or Subscription Access

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