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High-performance long-wavelength HgCdTe infrared detectors grownon silicon substrates

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Hall, D. J., Buckle, L., Gordon, N. T., Giess, J., Hails, J. E., Cairns, J. W., Lawrence, R. M., Graham, A., Hall, Ralph, Maltby, C. and Ashley, T. (2004) High-performance long-wavelength HgCdTe infrared detectors grownon silicon substrates. Applied Physics Letters, 85 (11). pp. 2113-2115. doi:10.1063/1.1791740

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Official URL: http://dx.doi.org/10.1063/1.1791740

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Abstract

Long-wavelength HgCdTe heterostructures on silicon (100) substrates have been grown using metal-organic vapor phase epitaxy. Test diodes have been fabricated from this material using mesa technology and flip-chip bonding. We have demonstrated excellent resistance-area product characteristics for diodes with a 10.2μm cutoff wavelength. R0A values approaching 103Ωcm2 at 80K have been measured and the resistance-area product maintained above 102Ωcm2 at 1V reverse bias. Variable temperature R0A values correspond to expected generation-recombination loss mechanisms between 60 and 120K. Current-voltage characteristics of two diodes at opposite sides of an array indicate that a very uniform imaging long-wavelength infrared array could be fabricated from this material.

Item Type: Journal Article
Divisions: Faculty of Science > Physics
Journal or Publication Title: Applied Physics Letters
Publisher: American Institute of Physics
ISSN: 0003-6951
Official Date: September 2004
Dates:
DateEvent
September 2004Published
17 September 2004Available
21 July 2004Accepted
Volume: 85
Number: 11
Page Range: pp. 2113-2115
DOI: 10.1063/1.1791740
Status: Peer Reviewed
Publication Status: Published
Access rights to Published version: Restricted or Subscription Access

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