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Atomic structure of interconnected few-layer graphene domains

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Robertson, Alex W., Bachmatiuk, Alicja, Wu, Yimin A., Schäffel, Franziska, Rellinghaus, Bernd, Büchner, Bernd, Rümmeli, Mark H. and Warner, Jamie H. (2011) Atomic structure of interconnected few-layer graphene domains. ACS Nano, 5 (8). pp. 6610-6618. doi:10.1021/nn202051g

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Official URL: http://dx.doi.org/10.1021/nn202051g

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Abstract

The atomic structure at the boundary interface between interconnected few-layer graphene (FLG) domains, synthesized by atmospheric pressure chemical vapor deposition (AP-CVD), is examined using aberration-corrected high-resolution transmission electron microscopy. Moiré patterns in the HRTEM images reveal the presence of rotational stacking faults in the boundary region that extend over distances of ∼100 nm. We show that FLG domains interconnect via two principle processes: graphene sheets from one domain grow over the top of a neighboring domain, while other graphene domains interconnect by direct atomic bonding. Differentiating between these two types of interconnects was found to be possible by examining the HRTEM contrast profiles produced at the interface. Graphene sheets that terminate were found to produce strong edge contrast with increasing defocus values, as well as a broader edge cross section, whereas atomically bonded interfaces were found to not exhibit any contrast, even under large defocus values. These findings are reinforced by correlating with multi-slice TEM image simulations of appropriate structures.

Item Type: Journal Article
Divisions: Faculty of Science, Engineering and Medicine > Science > Physics
Journal or Publication Title: ACS Nano
Publisher: American Chemical Society
ISSN: 1936-0851
Official Date: 23 August 2011
Dates:
DateEvent
23 August 2011Published
5 August 2011Available
22 July 2011Accepted
3 June 2011Submitted
Volume: 5
Number: 8
Page Range: pp. 6610-6618
DOI: 10.1021/nn202051g
Status: Peer Reviewed
Publication Status: Published
Access rights to Published version: Restricted or Subscription Access
Copyright Holders: American Chemical Society
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