Ion sputter deposition of shape memory alloy films for microactuators
UNSPECIFIED (1997) Ion sputter deposition of shape memory alloy films for microactuators. In: Conference on Micromachining and Microfabrication Process Technology III, AUSTIN, TX, SEP 29-30, 1997. Published in: MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY III, 3223 pp. 160-167.Full text not available from this repository.
Shape memory alloy (SMA) materials have a number of desirable properties which make them strong candidates for microactuator applications. Compared with other means of microactuation based on piezoelectric, electrostatic or bimetallic principles, SMA microactuators have advantages which include high maximum work energy density, high power/mass ratio and the capability of being driven without high applied electric fields. Consequently, other desirable features such as biocompatibility and scalability to small dimensions can also be exploited. In this paper we report on the production of TiNi shape memory films by ion sputter deposition onto unheated substrates using argon ions generated by a Kaufman-type source. The films were characterised by electrical resistivity measurements and by x-ray reflectometry. R-phase and martensitic transformations are seen without high temperature annealing and the shape memory properties observed are compared with those of films prepared by DC and RF magnetron sputtering.
|Item Type:||Conference Item (UNSPECIFIED)|
|Subjects:||Q Science > QC Physics|
|Series Name:||PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE)|
|Journal or Publication Title:||MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY III|
|Publisher:||SPIE - INT SOC OPTICAL ENGINEERING|
|Editor:||Chang, SC and Pang, SW|
|Number of Pages:||8|
|Page Range:||pp. 160-167|
|Title of Event:||Conference on Micromachining and Microfabrication Process Technology III|
|Location of Event:||AUSTIN, TX|
|Date(s) of Event:||SEP 29-30, 1997|
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