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Weak localisation and interaction of electrons in MBE delta<Sb>-layers in Si

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UNSPECIFIED (1996) Weak localisation and interaction of electrons in MBE delta<Sb>-layers in Si. In: 21st International Conference on Low Temperature Physics (LT 21), AUG 08-14, 1996, PRAGUE, CZECH REPUBLIC.

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Abstract

Temperature (1.6 - 20 K) and magnetic field (up to 2.5 T) dependences of quantum corrections to the conductivity and Hall coefficient of Si epitaxial films containing a delta < Sb >-layer of different sheet density N-Sb are studied. The quantum corrections are due to the effects of electron weak localization (WL) and electron-electron interaction (EEI). Analysis of the quantum corrections made it possible to determine the temperature dependence of electron phase relaxation time tau(phi), the spin-orbit interaction time tau(so) and the screening factor F. It is found that the dependence tau(phi)(T) is determined by the electron-electron scattering processes, tau(phi) proportional to T--p with p approximate to 1, and an increase in the parameter F with decreasing electron concentration n in the delta-layer is related to the specific features of the screening processes in two-dimensional electron systems.

Item Type: Conference Item (UNSPECIFIED)
Subjects: Q Science > QC Physics
Journal or Publication Title: CZECHOSLOVAK JOURNAL OF PHYSICS
Publisher: CZECHOSLOVAK JNL OF PHYSICS
ISSN: 0011-4626
Date: 1996
Volume: 46
Number: Suppl. 5
Number of Pages: 2
Page Range: pp. 2481-2482
Publication Status: Published
Title of Event: 21st International Conference on Low Temperature Physics (LT 21)
Location of Event: PRAGUE, CZECH REPUBLIC
Date(s) of Event: AUG 08-14, 1996
URI: http://wrap.warwick.ac.uk/id/eprint/18331

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