OPTICAL-PROPERTIES OF DRY-ETCHED SI/SI1-XGEX HETEROSTRUCTURE WIRES
UNSPECIFIED (1994) OPTICAL-PROPERTIES OF DRY-ETCHED SI/SI1-XGEX HETEROSTRUCTURE WIRES. In: 5th International Symposium on Silicon Molecular Beam Epitaxy (SIMBE-5), at the 1993 International Conference on Solid State Devices and Materials (SSDM 93), NIPPON CONVENT CTR, MAKUHARI MESSE, JAPAN, AUG 30-SEP 01, 1993. Published in: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 33 (4B). pp. 2348-2352.Full text not available from this repository.
This paper reports a study on the optical properties of molecular-beam-epitaxy-grown Si/Si1-xGex heterostructures reactive-ion-etched into nanometer-scale wires using both Raman scattering and photoluminescence measurements. The results show that except for a thin layer of disordered Si1-xGex alloy formed during the etching process, little damage was inflicted on the dry-etched sidewalls of the free-standing Si/Si1-xGex wires. With decreasing wire width, both dry-etching-induced strain relaxation and enhanced electron-hole droplet emission have been observed. The latter has been attributed to the lateral confinement of the wires which improves the nucleation of droplets. When the wire width is below about 40 nm, optical transitions due to quasi-one-dimensional confinement are clearly seen.
|Item Type:||Conference Item (UNSPECIFIED)|
|Subjects:||Q Science > QC Physics|
|Journal or Publication Title:||JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS|
|Publisher:||JAPAN J APPLIED PHYSICS|
|Official Date:||April 1994|
|Number of Pages:||5|
|Page Range:||pp. 2348-2352|
|Title of Event:||5th International Symposium on Silicon Molecular Beam Epitaxy (SIMBE-5), at the 1993 International Conference on Solid State Devices and Materials (SSDM 93)|
|Location of Event:||NIPPON CONVENT CTR, MAKUHARI MESSE, JAPAN|
|Date(s) of Event:||AUG 30-SEP 01, 1993|
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