The Library
COMPARISON BETWEEN COMPUTER-SIMULATION AND DIRECT SECONDARY-ION MASS-SPECTROMETRY MEASUREMENT OF LATERAL DOPANT DISTRIBUTIONS
Tools
Tools
Tools
UNSPECIFIED (1994) COMPARISON BETWEEN COMPUTER-SIMULATION AND DIRECT SECONDARY-ION MASS-SPECTROMETRY MEASUREMENT OF LATERAL DOPANT DISTRIBUTIONS. In: 2nd International Workshop on the Measurement and Characterization of Ultra-Shallow Doping Profiles in Semiconductors, MCNC, CTR MICROELECTR, RESEARCH TRIANGLE PK, NC, MAR 23-25, 1993. Published in: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 12 (1). pp. 243-246.
Full text not available from this repository.Abstract
A two-dimensional secondary ion mass spectrometry dopant profiling technique, using a specially prepared sample, has been used to provide high spatial resolution, high sensitivity, dopant maps of boron and arsenic. These have been compared with TSUPREM(IV) simulations. However, investigation of the disagreements between the modeled and experimental data cannot be made, as a major problem has been accurately determining the position of the mask edge on the reconstructed profile. Previous methods have introduced errors of up to 0.2 mum. This has been overcome by using a low energy, low dose, germanium implant as a marker of the mask window. The effect of this marker implant on the dopant distribution to be measured has been investigated and estimates of the accuracy of locating the mask edge have been made using the TSUPREM(IV) code. It is expected that the mask edge in later profiles will be located to better than 15 nm.
| Item Type: | Conference Item (UNSPECIFIED) | ||||
|---|---|---|---|---|---|
| Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering T Technology Q Science > QC Physics |
||||
| Journal or Publication Title: | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | ||||
| Publisher: | AMER INST PHYSICS | ||||
| ISSN: | 1071-1023 | ||||
| Official Date: | January 1994 | ||||
| Dates: |
|
||||
| Volume: | 12 | ||||
| Number: | 1 | ||||
| Number of Pages: | 4 | ||||
| Page Range: | pp. 243-246 | ||||
| Publication Status: | Published | ||||
| Title of Event: | 2nd International Workshop on the Measurement and Characterization of Ultra-Shallow Doping Profiles in Semiconductors | ||||
| Location of Event: | MCNC, CTR MICROELECTR, RESEARCH TRIANGLE PK, NC | ||||
| Date(s) of Event: | MAR 23-25, 1993 | ||||
| URI: | http://wrap.warwick.ac.uk/id/eprint/20811 |
Data sourced from Thomson Reuters' Web of Knowledge
Request changes or add full text files to a record
Actions (login required)
 |
View Item |
