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OPTICAL-PROPERTIES OF SI/SI1-XGEX HETEROSTRUCTURE BASED WIRES
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UNSPECIFIED (1993) OPTICAL-PROPERTIES OF SI/SI1-XGEX HETEROSTRUCTURE BASED WIRES. SOLID STATE COMMUNICATIONS, 85 (3). pp. 199-202. ISSN 0038-1098
Full text not available from this repository.Abstract
We report for the first time a study of the optical properties of nanostructured wires fabricated by using electron beam lithography and reactive ion etching in SiCl4 from a modulation doped p+-Si/Si1-xGex heterojunction structure. Both photoreflectance and photoluminescence at 4K show a fabrication process-induced partial strain relaxation and a quasi-one dimensional (1D) behavior when the wire width.reduces to less than about 40nm. A strong emission from electron-hole droplets in the quasi-1D wires is also detected.
| Item Type: | Journal Article |
|---|---|
| Subjects: | Q Science > QC Physics |
| Journal or Publication Title: | SOLID STATE COMMUNICATIONS |
| Publisher: | PERGAMON-ELSEVIER SCIENCE LTD |
| ISSN: | 0038-1098 |
| Date: | January 1993 |
| Volume: | 85 |
| Number: | 3 |
| Number of Pages: | 4 |
| Page Range: | pp. 199-202 |
| Publication Status: | Published |
| URI: | http://wrap.warwick.ac.uk/id/eprint/21572 |
Data sourced from Thomson Reuters' Web of Knowledge
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