UNSPECIFIED (1991) AN INVESTIGATION OF THE DIFFUSION OF SILICON IN DELTA-DOPED GALLIUM-ARSENIDE, AS DETERMINED USING HIGH-RESOLUTION SECONDARY ION MASS-SPECTROMETRY. JOURNAL OF APPLIED PHYSICS, 70 (2). pp. 821-826.

Research output not available from this repository, contact author.

Request Changes to record.

Abstract

Silicon delta-doped samples of various densities were grown by molecular-beam epitaxy and analyzed using high-resolution secondary ion mass spectrometry. A marked difference was observed between profiles produced from samples doped below a surface density of 1.3 x 10(13) cm-2, where all the silicon was incorporated on gallium sites, and highly doped samples, where autocompensation had occurred. All samples were grown at nominally 580-degrees-C and all the doped planes showed some degree of broadening. A computer model of a two-step diffusion process was developed which produced a set of diffusion coefficients for the lower-doped samples. The diffusion coefficient associated with the post deposition growth for these low-doped samples was approximately 4.2 X 10(-17) cm2 s-1. The more highly doped samples, because of their complicated profiles, were modeled using a graphical technique. This technique revealed the presence of a much larger diffusion coefficient, which is tentatively assigned to silicon diffusing as nearest-neighbor pairs.

Item Type:	Journal Article
Subjects:	Q Science > QC Physics
Journal or Publication Title:	JOURNAL OF APPLIED PHYSICS
Publisher:	AMER INST PHYSICS
ISSN:	0021-8979
Official Date:	15 July 1991
Dates:	Date Event 15 July 1991 UNSPECIFIED
Volume:	70
Number:	2
Number of Pages:	6
Page Range:	pp. 821-826
Publication Status:	Published

Data sourced from Thomson Reuters' Web of Knowledge

Request changes or add full text files to a record

Repository staff actions (login required)

View Item