Dobbie, A. (Andrew) (2007) Investigation of the electrical properties of Si₁-×Ge× channel pMOSFETs with high-κ dielectrics. PhD thesis, University of Warwick.

PDF WRAP_THESIS_Dobbie_2007.pdf - Requires a PDF viewer such as GSview, Xpdf or Adobe Acrobat Reader Download (4Mb)

Abstract

It is now apparent that the continued performance enhancements of silicon metal-oxide-semiconductor field effect transistors (MOSFETs) can no longer be met by scaling alone. High-mobility channel materials such as strained Si1-xGex and Ge are now being seriously considered to maintain the performance requirements specified by the semiconductor industry. In addition, alternative gate dielectric, or high-κ dielectrics, will also be required to meet gate leakage requirements.

This work investigates the properties of using strained Si1-xGex or Ge as alternative channel materials for pMOSFETs incorporating hafnium oxide (HfO2) high-κ gate dielectric. Whilst the SiGe pMOSFETs (x = 0.25) exhibited an enhancement in hole mobility (300 K) over comparable silicon control pMOSFETs with sputtered HfO2 dielectric, high Coulomb scattering and surface roughness scattering relating to the dielectric deposition process meant that the effective hole mobilities were degraded with respect to the silicon universal curve.

Germanium channel pMOSFETs with halo-doping and HfO2 gate dielectric deposited by atomic layer deposition showed high hole mobilities of 230 cm2V-1s-1 and 480 cm2V-1s-1 at room temperature and 77 K, respectively. Analysis of the off-state current for the Ge pMOSFETs over a range of temperatures indicated that band-to-band tunnelling, gate-induced drain leakage and other defect-assisted leakage mechanisms could all be important.

Hole carrier velocity and impact ionisation were also studied in two batches of buried channel SiGe pMOSFET with x = 0.15 and x = 0.36, respectively. SiGe channel pMOSFETs were found to exhibit reduced impact ionisation compared to silicon control devices, which has been attributed to a strain-induced reduction of the density of states in the SiGe conduction and valence bands. Analysis of the hole carrier velocity indicated that pseudomorphic SiGe offered no performance enhancements over Si below 100 nm, possibly due to higher ion implantation damage and strain relaxation of the strained SiGe channel. The results indicate that velocity overshoot effects might not provide the performance improvements at short channel lengths that was previously hoped for.

Item Type:	Thesis or Dissertation (PhD)
Alternative Title:	Investigation of the electrical properties of Si₁-×Ge× channel pMetal Oxide Semiconductor Field Effect Transistors with high-κ dielectrics
Subjects:	T Technology > TK Electrical engineering. Electronics Nuclear engineering Q Science > QC Physics
Library of Congress Subject Headings (LCSH):	Silicon compounds, Germanium compounds, Semiconductors, Metallic oxides -- Research, Dielectrics -- Research, Metal oxide semiconductor field-effect transistors
Official Date:	September 2007
Dates:	Date Event September 2007 Submitted
Institution:	University of Warwick
Theses Department:	Department of Physics
Thesis Type:	PhD
Publication Status:	Unpublished
Supervisor(s)/Advisor:	Leadley, D. R. (David R.) ; Parker, Evan H. C. ; Whall, Terry E.
Format of File:	pdf
Extent:	228 leaves : charts
Language:	eng
URI:	http://wrap.warwick.ac.uk/id/eprint/2561

Request changes or add full text files to a record

Actions (login required)

View Item

Downloads