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Improved effective mobility extraction in MOSFETs

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Thomas, Stephen M., Whall, Terry E., Parker, Evan H. C., Leadley, D. R. (David R.), Lander, Robert James Pascoe, Vellianitis, G. and Watling, J. R. (2009) Improved effective mobility extraction in MOSFETs. Solid-State Electronics, Vol.53 (No.12). pp. 1252-1256. doi:10.1016/j.sse.2009.09.014 ISSN 0038-1101.

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Official URL: http://dx.doi.org/10.1016/j.sse.2009.09.014

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Abstract

The standard method of extracting carrier effective mobility from electrical measurements on MOSFETs is reviewed and the assumptions implicit in this method are discussed. A novel technique is suggested that corrects for the difference in drain bias during IV and CV measurements. It is further shown that the lateral field and diffusion corrections, which are both commonly neglected, in fact cancel. The effectiveness of the proposed technique is demonstrated by application to data measured on a quasi-planar SOI finFET at 300 K and 4 K.

Item Type: Journal Article
Subjects: Q Science > QC Physics
Divisions: Faculty of Science, Engineering and Medicine > Science > Physics
Library of Congress Subject Headings (LCSH): Metal oxide semiconductor field-effect transistors -- Research, Electron mobility -- Research, Silicon-on-insulator technology -- Research, Electric fields -- Measurement
Journal or Publication Title: Solid-State Electronics
Publisher: Elsevier
ISSN: 0038-1101
Official Date: December 2009
Dates:
DateEvent
December 2009Published
Volume: Vol.53
Number: No.12
Page Range: pp. 1252-1256
DOI: 10.1016/j.sse.2009.09.014
Status: Peer Reviewed
Access rights to Published version: Open Access (Creative Commons)
Funder: Engineering and Physical Sciences Research Council (EPSRC), Seventh Framework Programme (European Commission) (FP7)
Grant number: 216171 (FP7)

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