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Molecular beam epitaxy Si/4H-SiC heterojunction diodes

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Mawby, P. A., Pérez-Tomás, Amador, Jennings, M. R., Davis, M., Covington, James A., Shah, V. A. and Grasby, T. (2007) Molecular beam epitaxy Si/4H-SiC heterojunction diodes. In: 14th International Workshop on the Physics of Semiconductor Devices, Indian Inst Technol, Mumbai, India, 16-20 Dec 2007. Published in: International Workshop on Physics of Semiconductor Devices, 2007. IWPSD 2007 pp. 775-780. ISBN 9781424417278. doi:10.1109/IWPSD.2007.4472633

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Official URL: http://dx.doi.org/10.1109/IWPSD.2007.4472633

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Abstract

The physical and electrical properties of silicon layers grown by molecular beam epitaxy (MBE) on commercial 4H-SiC substrates are reported. We investigate the effect of the Si doping type, Si doping concentration, Si. p temperature deposition and SiC surface cleaning procedure. Si/SiC monolithic integration of Si circuits with SiC power devices can be considered as an attractive proposition and has the potential to be applied to a broad range of applications. X-ray diffraction (XRD) and scanning electron microscopy (SEM) are used to determine the Si crystal structure (cubic silicon) and morphology. I-V and C-V measurements are performed to evaluate the rectifying diode characteristics along with the Si/SiC built-in potential and energy band offsets. In the last section, we propose that our n-n Si/SiC heteojunction diode current characteristics can be explained by an isojunction drift-diffusion and thermoionic emission model where the effect of doping concentration of the silicon layer and its conduction band offset with SiC is analysed.

Item Type: Conference Item (Paper)
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering
Q Science > QC Physics
Divisions: Faculty of Science, Engineering and Medicine > Engineering > Engineering
Journal or Publication Title: International Workshop on Physics of Semiconductor Devices, 2007. IWPSD 2007
Publisher: IEEE Computer Society
ISBN: 9781424417278
Editor: Narasimhan, KL and Sharma, DK
Official Date: 2007
Dates:
DateEvent
2007Published
Number of Pages: 6
Page Range: pp. 775-780
DOI: 10.1109/IWPSD.2007.4472633
Status: Peer Reviewed
Publication Status: Published
Conference Paper Type: Paper
Title of Event: 14th International Workshop on the Physics of Semiconductor Devices
Type of Event: Workshop
Location of Event: Indian Inst Technol, Mumbai, India
Date(s) of Event: 16-20 Dec 2007

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