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Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma

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Ren, Z., Heard, P. J., Marshall, Jessica M., Thomas, Pam A. and Yu, S. (2008) Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma. Journal of Applied Physics, Volume 103 (Number 3). . 034109 . doi:10.1063/1.2838180 ISSN 0021-8979.

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Official URL: http://dx.doi.org/10.1063/1.2838180

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Abstract

The etching characteristics of congruent LiNbO3 single crystals including doped LiNbO3 and proton-changed LiNbO3 have been studied in reactive ion etching (RIE) and inductively coupled plasma (ICP) etching tools, using different recipes of gas mixtures. The effects of parameters including working pressure, RIE power, and ICP power are investigated and analyzed by measurement of etching depth, selectivity, uniformity, etched surface state, and sidewall profile by means of focused ion beam etching, energy-dispersive x-ray analysis, secondary ion mass spectroscopy, scanning electron microscopy, and surface profilometry. The effects of a sample carrier wafer coating have also been investigated. Optimized processes with high etching rates, good mask selectivity, and a near-vertical profile have been achieved. Ridge waveguides on proton-exchanged LiNbO3 have been fabricated and optically measured. (c) 2008 American Institute of Physics.

Item Type: Journal Article
Subjects: Q Science > QC Physics
Divisions: Faculty of Science, Engineering and Medicine > Science > Physics
Library of Congress Subject Headings (LCSH): Lithium niobate, Plasma etching
Journal or Publication Title: Journal of Applied Physics
Publisher: American Institute of Physics
ISSN: 0021-8979
Official Date: 1 February 2008
Dates:
DateEvent
1 February 2008Published
Volume: Volume 103
Number: Number 3
Number of Pages: 8
Page Range:
Article Number: 034109
DOI: 10.1063/1.2838180
Status: Peer Reviewed
Publication Status: Published
Access rights to Published version: Restricted or Subscription Access
Funder: Engineering and Physical Sciences Research Council (EPSRC)
Grant number: EP/D06273X/1 (EPSRC)

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