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Filament seasoning and its effect on the chemistry prevailing in hot filament activated gas mixtures used in diamond chemical vapour deposition
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Comerford, Dane W., D'Haenens-Johansson, Ulrika F. S., Smith, James A., (Researcher in chemistry), Ashfold, M. N. R. and Mankelevich, Yuri A. (2008) Filament seasoning and its effect on the chemistry prevailing in hot filament activated gas mixtures used in diamond chemical vapour deposition. In: 4th International Conference on Hot-Wire CVD (Cat-CVD) Process, Takayama, Japan, Oct 04-08, 2006. Published in: Thin Solid Films, Volume 516 (Number 5). pp. 521-525. doi:10.1016/j.tsf.2007.06.114 ISSN 0040-6090.
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Official URL: http://dx.doi.org/10.1016/j.tsf.2007.06.114
Abstract
Tantalum hot filaments (HFs) find frequent use as a means of activating hydrocarbon/hydrogen mixtures used for chemical vapour deposition of thin film diamond. This contribution reports systematic studies of the power consumed by a tantalum HF, and companion laser based measurements of the relative H atom number densities in the gas phase adjacent to the HF surface, in pure H-2 and in dilute CH4/H-2 gas mixtures, as a function of process conditions (filament temperature, gas pressure, extent of HF carburisation). The measurements serve to highlight the way in which the adjacent gas phase chemistry and composition affects the HF surface chemistry, and vice versa. (C) 2007 Elsevier B.V. All tights reserved.
Item Type: | Conference Item (UNSPECIFIED) | ||||
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Subjects: | T Technology > TA Engineering (General). Civil engineering (General) Q Science > QC Physics |
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Divisions: | Faculty of Science, Engineering and Medicine > Science > Physics | ||||
Library of Congress Subject Headings (LCSH): | Chemical vapor deposition, Diamond, Surface chemistry, Ionized gases | ||||
Journal or Publication Title: | Thin Solid Films | ||||
Publisher: | Elsevier S.A. | ||||
ISSN: | 0040-6090 | ||||
Official Date: | 15 January 2008 | ||||
Dates: |
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Volume: | Volume 516 | ||||
Number: | Number 5 | ||||
Number of Pages: | 5 | ||||
Page Range: | pp. 521-525 | ||||
DOI: | 10.1016/j.tsf.2007.06.114 | ||||
Status: | Peer Reviewed | ||||
Publication Status: | Published | ||||
Access rights to Published version: | Restricted or Subscription Access | ||||
Description: | Proceedings of the Fourth International Conference on Hot-Wire CVD Cat-CVD Process |
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Funder: | Engineering and Physical Sciences Research Council (EPSRC), Royal Society (Great Britain), Rossiĭskiĭ fond fundamentalʼnykh issledovaniĭ [Russian Foundation for Basic Research] (RFFI) | ||||
Grant number: | 7101.2006.2 (RFFI) | ||||
Title of Event: | 4th International Conference on Hot-Wire CVD (Cat-CVD) Process | ||||
Type of Event: | Conference | ||||
Location of Event: | Takayama, Japan | ||||
Date(s) of Event: | Oct 04-08, 2006 |
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