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Changing face of surface metrology - art. no. 63571J

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Whitehouse, D. J. (David J.) (2006) Changing face of surface metrology - art. no. 63571J. In: 6th International Symposium on Instrumentation and Control Technology, Beijing, PEOPLES R CHINA, OCT 13-15, 2006. Published in: Signal Analysis, Measurement Theory, Photo-Electronic Technology, and Artificial Intelligence, Pts 1 and 2, 6357 (Part 1-2). J3571-J3571. ISBN 0-8194-6452-X. ISSN 0277-786X. doi:10.1117/12.716966

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Official URL: http://dx.doi.org/10.1117/12.716966

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Abstract

In common with most disciplines surface metrology is having to evolve in order to meet the new requirements demanded by miniaturization and the increased use of semi conductor planar technology. Changes are taking place in theory as well as in the other constituents of an engineering design such as material properties and new manufacturing processes. In this paper a number of issues will be discussed. They will be by no means a comprehensive list but sufficient will be investigated to give an idea of the nature and scope on the problem. Amongst the topics covered will be nomenclature, some mechanical properties, force balance etc. There will be a look back at the way in which surface metrology evolved to see if lessons can be learned.

Item Type: Conference Item (UNSPECIFIED)
Subjects: Q Science > QC Physics
Series Name: PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE)
Journal or Publication Title: Signal Analysis, Measurement Theory, Photo-Electronic Technology, and Artificial Intelligence, Pts 1 and 2
Publisher: SPIE-INT SOC OPTICAL ENGINEERING
ISBN: 0-8194-6452-X
ISSN: 0277-786X
Editor: Fang, J and Wang, Z
Official Date: 2006
Dates:
DateEvent
2006UNSPECIFIED
Volume: 6357
Number: Part 1-2
Number of Pages: 7
Page Range: J3571-J3571
DOI: 10.1117/12.716966
Publication Status: Published
Title of Event: 6th International Symposium on Instrumentation and Control Technology
Location of Event: Beijing, PEOPLES R CHINA
Date(s) of Event: OCT 13-15, 2006

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