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New Cs sputter ion source with polyatomic ion beams for secondary ion mass spectrometry applications

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Belykh, S. F., Palitsin, V. V., Veryovkin, I. V., Kovarsky, A. P., Chang, R. J. H., Adriaens, A. (Annemie), Dowsett, M. G. and Adams, F. (2007) New Cs sputter ion source with polyatomic ion beams for secondary ion mass spectrometry applications. Review of Scientific Instruments, Vol.78 (No.8). Article: 085101. doi:10.1063/1.2761021

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Official URL: http://dx.doi.org/10.1063/1.2761021

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Abstract

A simple design for a cesium sputter ion source compatible with vacuum and ion-optical systems as well as with electronics of the commercially available Cameca IMS-4f instrument is reported. This ion source has been tested with the cluster primary ions of Si-n(-) and Cu-n(-). Our experiments with surface characterization and depth profiling conducted to date demonstrate improvements of the analytical capabilities of the secondary ion mass spectrometry instrument due to the nonadditive enhancement of secondary ion emission and shorter ion ranges of polyatomic projectiles compared to atomic ones with the same impact energy.

Item Type: Journal Article
Subjects: Q Science > QC Physics
Divisions: Faculty of Science > Physics
Journal or Publication Title: Review of Scientific Instruments
Publisher: American Institute of Physics
ISSN: 0034-6748
Official Date: August 2007
Dates:
DateEvent
August 2007Published
Volume: Vol.78
Number: No.8
Number of Pages: 9
Page Range: Article: 085101
DOI: 10.1063/1.2761021
Status: Peer Reviewed
Publication Status: Published
Access rights to Published version: Restricted or Subscription Access
Funder: NATO, Belgian Federal Services for Scientific, Technical, and Cultural Affairs, EPSRC
Grant number: SfP Project No. 97-1929; DWTC/SSTC; GR/S78919/01

Data sourced from Thomson Reuters' Web of Knowledge

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