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Analysis of Al/Ti, Al/Ni multiple and triple layer contacts to p-type 4H-SiC
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Jennings, M. R., Pérez-Tomás, Amador, Davies, M., Walker, David, Zhu, L., Losee, P., Huang, W., Balachandran, S., Guy, O. J., Covington, James A., Chow, T. P. and Mawby, P. A. (2007) Analysis of Al/Ti, Al/Ni multiple and triple layer contacts to p-type 4H-SiC. Solid-State Electronics, Vol.51 (No.5). pp. 797-801. doi:10.1016/j.sse.2007.02.037 ISSN 0038-1101.
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Official URL: http://dx.doi.org/10.1016/j.sse.2007.02.037
Abstract
This paper presents an experimental investigation into different metallisation structures aimed at reducing the contact resistance and morphology of p-type contacts to 4H-SiC. The structures are based on a combination of Al/Ni and Al/Ti layers. The lowest specific contact resistivity obtained was based on a triple layer Al/Ti/Al contact, measured at 5.0 x 10(-6) Omega cm(2). Analogously, for the triple layer contacts comprised of Al/Ni/Al, the lowest specific contact resistivity was measured at 4.9 x 10(-4) Omega cm(2). In all cases it was found that the multiple layer structures remained rectifying even after annealing. A range of physical characterisation techniques were used to investigate these different structures. X-ray diffraction (XRD) scans point to enhanced formation of silicides for triple layer contacts based on Al/Ti (Ti3SiC2) and Al/Ni (NiSi,) when compared to multiple layer contacts. Scanning electron microscope (SEM) and wavelength dispersive analysis (WDA) measurements indicate that a multiple layer metallisation improves the morphology of the contact with respect to the Al spreading, which is known to be problematic during a high temperature anneal. (c) 2007 Elsevier Ltd. All rights reserved.
Item Type: | Journal Article | ||||
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Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering Q Science > QC Physics |
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Divisions: | Faculty of Science, Engineering and Medicine > Engineering > Engineering Faculty of Science, Engineering and Medicine > Science > Physics |
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Journal or Publication Title: | Solid-State Electronics | ||||
Publisher: | Elsevier | ||||
ISSN: | 0038-1101 | ||||
Official Date: | May 2007 | ||||
Dates: |
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Volume: | Vol.51 | ||||
Number: | No.5 | ||||
Number of Pages: | 5 | ||||
Page Range: | pp. 797-801 | ||||
DOI: | 10.1016/j.sse.2007.02.037 | ||||
Status: | Peer Reviewed | ||||
Publication Status: | Published | ||||
Access rights to Published version: | Restricted or Subscription Access |
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