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Topographical evolution of sputtered chromium nitride thin films

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Gerbig, Yvonne B., Spassov, V., Savan, A. and Chetwynd, D. G. (2007) Topographical evolution of sputtered chromium nitride thin films. Thin Solid Films, Vol.515 (No.5). pp. 2903-2920. doi:10.1016/j.tsf.2006.08.031 ISSN 0040-6090.

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Official URL: http://dx.doi.org/10.1016/j.tsf.2006.08.031

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Abstract

The modification of the morphology, with special emphasis on the topographical evolution, of chromium nitride thin films has been studied by varying the sputter power, bias voltage, temperature, total pressure and Ar/N-2 ratio in an unbalanced magnetron sputtering process. Six different topography types (here designated pyramid, grain, crater, cone, ribbon and hillock) were identified. The growth conditions for each topography type are specified and summarized in a topography zone model showing the occurrence of each as function of temperature, Ar/N-2 ratio, deposition rate and bias voltage. Furthermore, the relationship between the size of the topographical features and the deposition parameters was investigated and is reported in detail. The control of topographical type and feature size appears sufficient to hold promise of generating topographies designed for specific functions.

Item Type: Journal Article
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Q Science > QC Physics
Divisions: Faculty of Science, Engineering and Medicine > Engineering > Engineering
Journal or Publication Title: Thin Solid Films
Publisher: Elsevier S.A.
ISSN: 0040-6090
Official Date: 24 January 2007
Dates:
DateEvent
24 January 2007Published
Volume: Vol.515
Number: No.5
Number of Pages: 18
Page Range: pp. 2903-2920
DOI: 10.1016/j.tsf.2006.08.031
Status: Peer Reviewed
Publication Status: Published
Access rights to Published version: Restricted or Subscription Access

Data sourced from Thomson Reuters' Web of Knowledge

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