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Temperature behavior and modeling of ohmic contacts to Si+ implanted n-type GaN

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Pérez-Tomás, Amador, Placidi, Marcel, Fontserè, A., Gammon, P. M. and Jennings, M. R.. (2011) Temperature behavior and modeling of ohmic contacts to Si+ implanted n-type GaN. Microelectronics Reliability, Vol.51 (No.8). pp. 1325-1329. ISSN 00262714

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Official URL: http://dx.doi.org/10.1016/j.microrel.2011.03.023

Abstract

The behavior of an ohmic contact to an implanted Si GaN n-well in the temperature range of 25-300 degrees C has been investigated. This is the sort of contact one would expect in many GaN based devices such as (source/drain) in a metal-oxide-semiconductor transistor. A low resistivity ohmic contact was achieved using the metal combination of Ti (350 angstrom)/Al (1150 angstrom) on a protected (SiO(2) cap) and unprotected samples during the post implantation annealing. Sheet resistance of the implanted layer and metal-semiconductor contact resistance to N(+) GaN have been extracted at different temperatures. Both, the experimental sheet resistance and the contact resistance decrease with the temperature and their characteristics are fitted by means of physical based models.

Item Type: Journal Article
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions: Faculty of Science > Engineering
Library of Congress Subject Headings (LCSH): Ohmic contacts, Ohmic contacts -- Mathematical models, Gallium nitride, Silicon
Journal or Publication Title: Microelectronics Reliability
Publisher: Pergamon
ISSN: 00262714
Date: August 2011
Volume: Vol.51
Number: No.8
Number of Pages: 5
Page Range: pp. 1325-1329
Identification Number: 10.1016/j.microrel.2011.03.023
Status: Peer Reviewed
Publication Status: Published
Access rights to Published version: Restricted or Subscription Access
Funder: Spain. Ministerio de Ciencia e Innovación (MCINN)
Grant number: TEC2008-05577/TEC (MCINN)
URI: http://wrap.warwick.ac.uk/id/eprint/38541

Data sourced from Thomson Reuters' Web of Knowledge

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