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Fractal growth of copper electrodeposits
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Brady, R. M. and Ball, Robin (1984) Fractal growth of copper electrodeposits. Nature, Vol.309 (No.5965). pp. 225-229. doi:10.1038/309225a0
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Official URL: http://dx.doi.org/10.1038/309225a0
Abstract
Black dendritic growths of copper were electrodeposited in steady-state diffusion-limited conditions onto an initially point-like cathode. Their spatial extent R was inferred from the increased current and their mass M from the total charge transferred. Fractal behaviour M∝R D was observed with D = 2.43 ±0.03, in good agreement with computer simulations of diffusion-limited aggregation.
| Item Type: | Journal Article | ||||
|---|---|---|---|---|---|
| Subjects: | Q Science > QC Physics Q Science > QD Chemistry |
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| Divisions: | Faculty of Science > Physics | ||||
| Library of Congress Subject Headings (LCSH): | Electroforming, Copper plating, Copper -- Electrometallurgy, Aggregation (Chemistry) -- Computer simulation, Fractals | ||||
| Journal or Publication Title: | Nature | ||||
| Publisher: | Nature Publishing Group | ||||
| ISSN: | 0028-0836 | ||||
| Official Date: | 1984 | ||||
| Dates: |
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| Volume: | Vol.309 | ||||
| Number: | No.5965 | ||||
| Page Range: | pp. 225-229 | ||||
| DOI: | 10.1038/309225a0 | ||||
| Status: | Peer Reviewed | ||||
| Publication Status: | Published |
Data sourced from Thomson Reuters' Web of Knowledge
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