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Fractal growth of copper electrodeposits

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Brady, R. M. and Ball, Robin (1984) Fractal growth of copper electrodeposits. Nature, Vol.309 (No.5965). pp. 225-229. doi:10.1038/309225a0

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Official URL: http://dx.doi.org/10.1038/309225a0

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Abstract

Black dendritic growths of copper were electrodeposited in steady-state diffusion-limited conditions onto an initially point-like cathode. Their spatial extent R was inferred from the increased current and their mass M from the total charge transferred. Fractal behaviour M∝R D was observed with D = 2.43 ±0.03, in good agreement with computer simulations of diffusion-limited aggregation.

Item Type: Journal Article
Subjects: Q Science > QC Physics
Q Science > QD Chemistry
Divisions: Faculty of Science, Engineering and Medicine > Science > Physics
Library of Congress Subject Headings (LCSH): Electroforming, Copper plating, Copper -- Electrometallurgy, Aggregation (Chemistry) -- Computer simulation, Fractals
Journal or Publication Title: Nature
Publisher: Nature Publishing Group
ISSN: 0028-0836
Official Date: 1984
Dates:
DateEvent
1984Published
Volume: Vol.309
Number: No.5965
Page Range: pp. 225-229
DOI: 10.1038/309225a0
Status: Peer Reviewed
Publication Status: Published

Data sourced from Thomson Reuters' Web of Knowledge

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