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Ohmic contact resistance to GaN devices dependence with on temperature for GaN devices

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Pérez-Tomás, Amador, Fontserè, A., Placidi, Marcel, Baron, N., Chenot, Sébastien, Cordier, Yvon, Moreno, J.C., Gammon, P. M. and Jennings, Michael R. (2011) Ohmic contact resistance to GaN devices dependence with on temperature for GaN devices. In: 8th European Conference on Silicon Carbide and Related Materials (ECSCRM 2010), Oslo, Norway, Aug 29 - Sep 2, 2010. Published in: Materials Science Forum, Vol. 679-680 pp. 816-819.

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Official URL: http://dx.doi.org/10.4028/www.scientific.net/MSF.6...

Abstract

The temperature dependence of Ohmic contacts to GaN devices is investigated in this paper via by measuring TLM contact resistances TLM vs Tas a function of temperature. measurements. In particular, the two types of Ohmic contacts are considered: (1) Contacts to highly doped implanted regions (such as the MOSFET drain/source contacts or the back contact of Schottky diodes) and (2) contacts to the 2 dimensional electron gas (2DEG) of an AlGaN/GaN heterojunction.

Item Type: Conference Item (Paper)
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions: Faculty of Science > Engineering
Journal or Publication Title: Materials Science Forum
Publisher: Trans Tech Publications Ltd.
ISSN: 0255-5476
Date: 2011
Volume: Vol. 679-680
Page Range: pp. 816-819
Identification Number: 10.4028/www.scientific.net/MSF.679-680.816
Status: Peer Reviewed
Publication Status: Published
Access rights to Published version: Restricted or Subscription Access
Conference Paper Type: Paper
Title of Event: 8th European Conference on Silicon Carbide and Related Materials (ECSCRM 2010)
Type of Event: Conference
Location of Event: Oslo, Norway
Date(s) of Event: Aug 29 - Sep 2, 2010
URI: http://wrap.warwick.ac.uk/id/eprint/46251

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