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Growth and characterisation of dilute nitride antimonide layers by plasma-assisted molecular beam epitaxy
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Bomphrey, J. J. (2011) Growth and characterisation of dilute nitride antimonide layers by plasma-assisted molecular beam epitaxy. PhD thesis, University of Warwick.
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Official URL: http://webcat.warwick.ac.uk/record=b2569094~S1
Abstract
The work presented in this thesis is concerned with the growth and characterisation of III-NSb films by plasma-assisted molecular beam epitaxy (PA-MBE). The research was motivated by their application in technologically important regions of the IR spectrum. Homoepitaxial growth of GaSb films was conducted and characterised as a function of V:III ratio and growth temperature, permitting observation of morphology changes with growth conditions, also providing insight into surfaces of the ternary dilute nitride. Heteroepitaxial GaSb/GaAs growth has highlighted defect formation and propagation arising from lattice mismatched deposition. Films of GaNxSb1-x, a material of interest for device applications in the 2-5 μm spectral range, have been grown on GaSb(001) substrates. The results demonstrate the degree to which substitutional N content may be controlled through variation of the temperature and rate of deposition. Models based upon kinetic and thermodynamic principles and previously applied to GaNxAs1-x have been evaluated for N content of GaNxSb1-x films as a function of the rate and temperature used for growth. The growth of InNxSb1-x, an alloy of significance in the technologically important wavelength region of 8-12 μm, upon InSb(001) substrates is described. There is qualitative agreement with the temperature dependence of N content. Analysis of the substitutional N content as a function of growth rate, however, suggests a difference between GaNxSb1-x and GaNxAs1-x. An explanation is presented for the trend in the level of substitutional N uptake across III-V-N materials. Further experiments are proposed to extend the parameter space sampled in the investigation of GaNxSb1-x and InNxSb1-x films, with regard to the Sb:III ratio employed during growth. Initial results are reported from measurements undertaken with a pyrometer operating at 1.6 μm, suggesting that growth can be conducted at lower temperatures. Additional preliminary results are presented for the growth of GaxIn1-xNySb1-y films, demonstrating a tuneable band gap quaternary material, lattice matched to GaSb is possible.
| Item Type: | Thesis or Dissertation (PhD) |
|---|---|
| Subjects: | Q Science > QD Chemistry |
| Library of Congress Subject Headings (LCSH): | Molecular beam epitaxy, Homoepitaxy, Thin films |
| Date: | May 2011 |
| Institution: | University of Warwick |
| Theses Department: | Department of Chemistry |
| Thesis Type: | PhD |
| Publication Status: | Unpublished |
| Supervisor(s)/Advisor: | Jones, Tim |
| Extent: | xii, 254 leaves : ill., charts |
| Language: | eng |
| URI: | http://wrap.warwick.ac.uk/id/eprint/47155 |
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