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Size and spatial homogeneity of SiGe quantum dots in amorphous silica matrix

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Buljan, Maja, Pinto, Sara R. C., Kashtiban, Reza J., Rolo, Anabela G., Chahboun, Adil, Bangert, Ursel, Levichev, Sergey, Holý, Václav and Gomes, Maria J. M. (2009) Size and spatial homogeneity of SiGe quantum dots in amorphous silica matrix. Journal of Applied Physics, Vol. 106 (No. 8). 084319. doi:10.1063/1.3248373

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Official URL: http://dx.doi.org/10.1063/1.3248373

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Abstract

In this paper, we present a study of structural properties of SiGe quantum dots formed in amorphous silica matrix by magnetron sputtering technique. We investigate deposition conditions leading to the formation of dense and uniformly sized quantum dots, distributed homogeneously in the matrix. X-ray and Raman spectroscopy were used to estimate the Si content. A detailed analysis based on grazing incidence small angle x-ray scattering revealed the influence of the deposition conditions on quantum dot sizes, size distributions, spatial arrangement, and concentration of quantum dots in the matrix, as well as the Si:Ge content.

Item Type: Journal Article
Divisions: Faculty of Science, Engineering and Medicine > Science > Physics
Journal or Publication Title: Journal of Applied Physics
Publisher: IEEE
ISSN: 0021-8979
Official Date: 2009
Dates:
DateEvent
2009Published
Volume: Vol. 106
Number: No. 8
Page Range: 084319
DOI: 10.1063/1.3248373
Status: Peer Reviewed
Publication Status: Published
Access rights to Published version: Restricted or Subscription Access

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