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Study of erbium-doped silicon nanocrystals in silica

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Kashtiban, Reza J., Bangert, U, Crowe, I F, Halsall, M, Harvey, A J and Gass, M. (2010) Study of erbium-doped silicon nanocrystals in silica. Journal of Physics: Conference Series, Vol. 241 . 012097. ISSN 1742-6596

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Official URL: http://dx.doi.org/10.1088/1742-6596/241/1/012097

Abstract

Er-doped SiO2 and Er-doped Si-NCs embedded in a SiO2 matrix were produced by Er and/or Si ion beam implantation of a Si (100) substrate. The composition and distribution of implanted Er varies in samples either with or without Si implants. HAADF and EELS detail in samples with Si implants, the Si and Er distribution is identical, and within a band of ~110 nm width at ~75 nm below the SiO2 surface. Intense PL emission at 1.54 μm confirms formation of ErSi2, for the majority of aggregates, is unlikely. The present investigation details most Si-NCs are surrounded by Er2O3, or possess this phase within.

Item Type: Journal Article
Divisions: Faculty of Science > Physics
Journal or Publication Title: Journal of Physics: Conference Series
Publisher: Institute of Physics Publishing Ltd.
ISSN: 1742-6596
Date: 2010
Volume: Vol. 241
Page Range: 012097
Identification Number: 10.1088/1742-6596/241/1/012097
Status: Peer Reviewed
Publication Status: Published
Access rights to Published version: Restricted or Subscription Access
URI: http://wrap.warwick.ac.uk/id/eprint/48407

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