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Structural and compositional study of Erbium-doped silicon nanocrystals by HAADF, EELS and HRTEM techniques in an aberration corrected STEM

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Kashtiban, Reza J., Bangert, U, Crowe, I, Halsall, M P, Sherliker, B, Harvey, A J, Eccles, J, Knights, A P, Gwilliam, R and Gass, M. (2010) Structural and compositional study of Erbium-doped silicon nanocrystals by HAADF, EELS and HRTEM techniques in an aberration corrected STEM. Journal of Physics: Conference Series, Vol. 209 (No. 1). 012043. ISSN 1742-6596

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Abstract

Er-doped SiO2 and Si nano-crystals (NCs) embedded in a SiO2 matrix were produced by ion beam implantation of Si (100) substrates. After annealing Er ions agglomerate in different positions with different compositional properties in samples with and without Si implants. HAADF and EELS show that in the sample with Si implants the Si and Er distribution is identical and within a band of ~110nm width ~75nm below theSiO2 surface whereas in the sample with no excess Si, Er forms on average much larger, amorphous aggregates, presumably an Er-oxide, in the SiO2 matrix with tendency to move towards the surface of the SiO2 layer.

Item Type: Journal Article
Divisions: Faculty of Science > Physics
Journal or Publication Title: Journal of Physics: Conference Series
Publisher: Institute of Physics Publishing Ltd.
ISSN: 1742-6596
Official Date: 2010
Volume: Vol. 209
Number: No. 1
Page Range: 012043
Identification Number: 10.1088/1742-6596/209/1/012043
Status: Peer Reviewed
Publication Status: Published
URI: http://wrap.warwick.ac.uk/id/eprint/48414

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