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Copper deposition at segmented, reticulated vitreous carbon cathode in Hull cell
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Tangirala, Ravichandra, Low, C. T. J., Ponce-de-León, C., Campbell, S. A. and Walsh, F. C. (2010) Copper deposition at segmented, reticulated vitreous carbon cathode in Hull cell. Transactions of the Institute of Metal Finishing, Vol.88 (No.2). pp. 84-92. doi:10.1179/174591910X12646070884872 ISSN 0020-2967.
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Official URL: http://dx.doi.org/10.1179/174591910X12646070884872
Abstract
The electrodeposition of copper from an acid sulphate solution has been studied in a Hull cell fitted with four types of cathode; a carbon plate or a reticulated vitreous carbon (RVC) sheet was used either in a continuous or segmented form. The rates of mass transport to the planar plate and RVC electrodes have been compared in static and stirred electrolytes containing 50, 75 and 100 mmol dm?3 CuSO4 in 0?5 mol dm?3 Na2SO4 at pH 2 and 298 K. The cathodes were divided into 10 equal sections and current vs. potential curves were obtained for each section at a constant current up to 140 mA. The current distribution over the cathodes followed a logarithmic decay with distance along the cathode; segments nearest to the anode experienced the highest rate of copper deposition.
Item Type: | Journal Article | ||||
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Divisions: | Faculty of Science, Engineering and Medicine > Engineering > WMG (Formerly the Warwick Manufacturing Group) | ||||
Journal or Publication Title: | Transactions of the Institute of Metal Finishing | ||||
Publisher: | Maney Publishing | ||||
ISSN: | 0020-2967 | ||||
Official Date: | March 2010 | ||||
Dates: |
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Volume: | Vol.88 | ||||
Number: | No.2 | ||||
Page Range: | pp. 84-92 | ||||
DOI: | 10.1179/174591910X12646070884872 | ||||
Status: | Peer Reviewed | ||||
Publication Status: | Published | ||||
Access rights to Published version: | Restricted or Subscription Access |
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