Claus, D., Robinson, D. J., Chetwynd, D. G., Shuo, Y., Pike, W. T., De J Toriz Garcia, José J. and Rodenburg, J. M. (2013) Dual wavelength optical metrology using ptychography. Journal of Optics, 15 (3). Article number 035702. doi:10.1088/2040-8978/15/3/035702 ISSN 2040-8978.

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Abstract

We describe an experimental implementation of ptychography to optical metrology, in particular topography measurement, in combination with the dual wavelength method. This is the first published account of the application of the dual wavelength method to ptychography or any other phase retrieval method in order to obtain surface height information over a wide range of scales, from small fractions of a wavelength up to many tens of wavelengths, in reflection mode. Moreover, the work presented here is the first report on the application of lensless reflection mode ptychography. Advantages of the ptychographic dual wavelength method are compared with other optical topography measurement techniques, especially with respect to the experimental procedures and constraints and the analysis of the data. We show that dual wavelength ptychography can remove material-specific phase changes which adversely affect topography measurements using white light profilometry.

Item Type:	Journal Article
Divisions:	Faculty of Science, Engineering and Medicine > Engineering > Engineering
Journal or Publication Title:	Journal of Optics
Publisher:	Institute of Physics Publishing Ltd.
ISSN:	2040-8978
Official Date:	2013
Dates:	Date Event 2013 Published
Volume:	15
Number:	3
Page Range:	Article number 035702
DOI:	10.1088/2040-8978/15/3/035702
Status:	Peer Reviewed
Publication Status:	Published
Access rights to Published version:	Restricted or Subscription Access

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