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Bow free 4'' diameter 3C-SiC Epilayers formed upon wafer-bonded Si/SiC substrates
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Jennings, M. R., Pérez-Tomás, Amador, Bashir, A., Sánchez, Ana M., Severino, A., Ward, Peter J., Thomas, S. M., Fisher, Craig A., Gammon, P. M., Zabala, M., Burrows, S. E., Donnellan, B., Hamilton, D. P., Walker, David and Mawby, P. A. (2012) Bow free 4'' diameter 3C-SiC Epilayers formed upon wafer-bonded Si/SiC substrates. ECS Solid State Letters, Volume 1 (Number 6). P85-P88. doi:10.1149/2.007206ssl ISSN 2162-8742.
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Official URL: http://dx.doi.org/10.1149/2.007206ssl
Abstract
The physical and electrical properties of 4-inch 3C-SiC epitaxial layers, deposited on Si (111) wafers, which were wafer bonded to polycrystalline silicon carbide carrier wafers, are presented. We show that this novel Si/SiC wafer bonding process leads to reduced wafer bow, confirmed by imaging, in the form of optical microscopy (×100 objective lens) together with a digital camera. All 3C-SiC layers grown above Si/SiC structures by conventional chemical vapor deposition techniques are shown to be single crystal in nature. 3C-SiC metal oxide semiconductor capacitors have been fabricated via thermal oxidation at 1100°C in pure oxygen for 90 minutes, with a density of interface states measured at ∼2 × 1011 cm−2 eV−1 at 0.2 eV beneath the conduction band edge. These structures have the potential to realize thick, bow-free 3C-SiC layers suitable for power device fabrication.
Item Type: | Journal Article | ||||
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Divisions: | Faculty of Science, Engineering and Medicine > Science > Physics | ||||
Journal or Publication Title: | ECS Solid State Letters | ||||
Publisher: | Electrochemical Society, Inc. | ||||
ISSN: | 2162-8742 | ||||
Official Date: | 2012 | ||||
Dates: |
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Volume: | Volume 1 | ||||
Number: | Number 6 | ||||
Page Range: | P85-P88 | ||||
DOI: | 10.1149/2.007206ssl | ||||
Status: | Peer Reviewed | ||||
Publication Status: | Published | ||||
Access rights to Published version: | Restricted or Subscription Access |
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