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Ptychography applied to optical metrology

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Claus, Daniel, Robinson, David J., Chetwynd, D. G., Yang, Shuo, Pike, W. Thomas and Rodenburg, John M. (2012) Ptychography applied to optical metrology. In: 5th International Conference on Speckle Metrology, Speckle 2012, Vigo, Spain, 10-12 Sept 2012. Published in: Proceedings of SPIE - The International Society for Optical Engineering, Volume 8413 Article number 84130O. doi:10.1117/12.977959 ISSN 0277-786X.

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Official URL: http://dx.doi.org/10.1117/12.977959

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Abstract

This paper introduces ptychography, a novel and very exciting phase retrieval technique, to the field of optical metrology. Its working principle is explained and a useful application in combination with the dual wavelength method for topography measurement is presented. Advantages of the dual wavelength method compared to other optical topography measurement techniques, the experimental procedure and the analysis of the data are discussed

Item Type: Conference Item (Paper)
Divisions: Faculty of Science, Engineering and Medicine > Engineering > Engineering
Journal or Publication Title: Proceedings of SPIE - The International Society for Optical Engineering
Publisher: S P I E - International Society for Optical Engineering
ISSN: 0277-786X
Book Title: Speckle 2012: V International Conference on Speckle Metrology
Official Date: 11 September 2012
Dates:
DateEvent
11 September 2012Published
Volume: Volume 8413
Page Range: Article number 84130O
DOI: 10.1117/12.977959
Status: Not Peer Reviewed
Publication Status: Published
Access rights to Published version: Restricted or Subscription Access
Conference Paper Type: Paper
Title of Event: 5th International Conference on Speckle Metrology, Speckle 2012
Type of Event: Conference
Location of Event: Vigo, Spain
Date(s) of Event: 10-12 Sept 2012

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