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Thickness dependent stresses and thermal expansion of epitaxial LiNbO3 thin films on C-sapphire
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Bartasyte, A., Plausinaitiene, V., Abrutis, A., Stanionyte, S., Margueron, S., Kubilius, V., Boulet, P., Huband, Steven and Thomas, Pam A. (2015) Thickness dependent stresses and thermal expansion of epitaxial LiNbO3 thin films on C-sapphire. Materials Chemistry and Physics, Volume 149-150 . pp. 622-631. doi:10.1016/j.matchemphys.2014.11.018 ISSN 0254-0584.
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Official URL: http://dx.doi.org/10.1016/j.matchemphys.2014.11.01...
Abstract
LiNbO3 films of high epitaxial quality and with thicknesses of 120–500 nm were deposited at 650 °C on C-sapphire by atmospheric pressure metal-organic chemical vapour deposition. Li nonstoichiometry, residual stresses, twinning, and thermal expansion of the films as a function of the film thickness were investigated by means of Raman spectroscopy and X-ray diffraction. The relaxation of residual stresses, Li2O loss, inelastic deformation and elastic hysteresis during cycles of heating up to 860 °C and cooling down to room temperature were studied, as well. The residual stresses and thermal expansion of films were highly thickness dependent. It was shown that the View the MathML source twinning contributed to the stress relaxation in the thick LiNbO3 films.
Item Type: | Journal Article | ||||||||||
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Divisions: | Faculty of Science, Engineering and Medicine > Science > Chemistry | ||||||||||
Journal or Publication Title: | Materials Chemistry and Physics | ||||||||||
Publisher: | Elsevier SA | ||||||||||
ISSN: | 0254-0584 | ||||||||||
Official Date: | 15 January 2015 | ||||||||||
Dates: |
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Volume: | Volume 149-150 | ||||||||||
Page Range: | pp. 622-631 | ||||||||||
DOI: | 10.1016/j.matchemphys.2014.11.018 | ||||||||||
Status: | Peer Reviewed | ||||||||||
Publication Status: | Published | ||||||||||
Access rights to Published version: | Restricted or Subscription Access |
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