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Effects of polarization on four-beam laser interference lithography
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Wang, Dapeng, Wang, Zuobin, Zhang, Ziang, Yue, Yong, Li, Dayou and Maple, Carsten (2013) Effects of polarization on four-beam laser interference lithography. Applied Physics Letters, 102 (8). 081903. doi:10.1063/1.4793752 ISSN 0003-6951.
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Official URL: http://dx.doi.org/10.1063/1.4793752
Abstract
This paper demonstrates that polarization plays an important role in the formation of interference patterns, pattern contrasts, and periods in four-beam interference lithography. Three different polarization modes are presented to study the effects of polarization on four-beam laser interference based on theoretical analysis, simulations, and experiments. A four-beam laser interference system was set up to modify the silicon surface. It was found that the secondary periodicity or modulation was the result of the misaligned or unequal incident angles only in the case of the TE-TE-TM-TM mode. The resulting patterns have shown a good correspondence with the theoretical analysis and simulations.
Item Type: | Journal Article | ||||||
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Divisions: | Faculty of Science, Engineering and Medicine > Engineering > WMG (Formerly the Warwick Manufacturing Group) | ||||||
Journal or Publication Title: | Applied Physics Letters | ||||||
Publisher: | American Institute of Physics | ||||||
ISSN: | 0003-6951 | ||||||
Official Date: | 28 February 2013 | ||||||
Dates: |
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Volume: | 102 | ||||||
Number: | 8 | ||||||
Article Number: | 081903 | ||||||
DOI: | 10.1063/1.4793752 | ||||||
Status: | Peer Reviewed | ||||||
Publication Status: | Published | ||||||
Access rights to Published version: | Restricted or Subscription Access |
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