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Functional oxide as an extreme high-k dielectric towards 4H-SiC MOSFET incorporation
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Russell, Stephen, Jennings, M. R. (Michael R.), Dai, Tianxiang, Li, Fan, Hamilton, Dean P., Fisher, Craig A., Sharma, Yogesh K., Mawby, P. A. (Philip A.) and Pérez-Tomás, Amador (2017) Functional oxide as an extreme high-k dielectric towards 4H-SiC MOSFET incorporation. Materials Science Forum, 897 . pp. 155-158. doi:10.4028/www.scientific.net/MSF.897.155 ISSN 1662-9752.
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WRAP-functional-oxide-extreme-high-k Dielectric-Russell-2017.pdf - Accepted Version - Requires a PDF viewer. Download (601Kb) | Preview |
Official URL: http://dx.doi.org/10.4028/www.scientific.net/MSF.8...
Abstract
MOS Capacitors are demonstrated on 4H-SiC using an octahedral ABO3 ferroic thin-film as a dielectric prepared on several buffer layers. Five samples were prepared: ABO3 on SiC, ABO3 on SiC with a SiO2 buffer (10 nm and 40 nm) and ABO3 on SiC with an Al2O3 buffer (10nm and 40 nm). Depending on the buffer material the oxide forms in either the pyrochlore or perovskite phase. A better lattice match with the Al2O3 buffer yields a perovskite phase with internal switchable dipoles. Hysteresis polarization-voltage loops show an oxide capacitance of ~ 0.2 μF/cm2 in the accumulation region indicating a dielectric constant of ~120.
Item Type: | Journal Article | ||||||
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Subjects: | Q Science > QC Physics T Technology > TK Electrical engineering. Electronics Nuclear engineering |
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Divisions: | Faculty of Science, Engineering and Medicine > Engineering > Engineering Faculty of Science, Engineering and Medicine > Science > Physics |
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Library of Congress Subject Headings (LCSH): | Metal oxide semiconductor field-effect transistors, Silicon carbide, Perovskite, X-rays -- Diffraction | ||||||
Journal or Publication Title: | Materials Science Forum | ||||||
Publisher: | Trans Tech Publications Ltd. | ||||||
ISSN: | 1662-9752 | ||||||
Official Date: | 15 May 2017 | ||||||
Dates: |
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Volume: | 897 | ||||||
Page Range: | pp. 155-158 | ||||||
DOI: | 10.4028/www.scientific.net/MSF.897.155 | ||||||
Status: | Peer Reviewed | ||||||
Publication Status: | Published | ||||||
Date of first compliant deposit: | 18 May 2017 | ||||||
Date of first compliant Open Access: | 18 May 2017 | ||||||
Funder: | Innovate UK |
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