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Some topics in surface and nanometrology

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UNSPECIFIED (2003) Some topics in surface and nanometrology. In: Conference on Optical Measurement Systems for Industrial Inspection III, JUN 23-26, 2003, MUNICH, GERMANY.

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Abstract

Some problems associated with surface metrology instrumentation and theory are discussed. In particular problems in Nanometrology are highlighted with reference to Markov processes and fractal analysis. A systems approach to surface characterization is suggested.

Item Type: Conference Item (UNSPECIFIED)
Subjects: Q Science > QC Physics
Series Name: PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE)
Journal or Publication Title: OPTICAL MEASUREMENT SYSTEMS FOR INDUSTRIAL INSPECTION III
Publisher: SPIE-INT SOC OPTICAL ENGINEERING
ISBN: 0-8194-5014-6
ISSN: 0277-786X
Editor: Osten, W and Creath, K and Kujawinska, M
Date: 2003
Volume: 5144
Number of Pages: 16
Page Range: pp. 1-16
Publication Status: Published
Title of Event: Conference on Optical Measurement Systems for Industrial Inspection III
Location of Event: MUNICH, GERMANY
Date(s) of Event: JUN 23-26, 2003
URI: http://wrap.warwick.ac.uk/id/eprint/9026

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