Study of the surfaces of CVD-WO3 films, by atomic force microscopy and spectroscopic ellipsometry
UNSPECIFIED (2003) Study of the surfaces of CVD-WO3 films, by atomic force microscopy and spectroscopic ellipsometry. In: 12th International School on Condensed Matter Physics, VARNA, BULGARIA, SEP 01-06, 2002. Published in: JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 14 (10-12). pp. 769-770.Full text not available from this repository.
Atomic force microscopy imaging of chemical vapor deposition WO3 films reveals the presence of domed crystallites that resemble the florets of cauliflowers with a rough surface texture. Annealing at 400degreesC and above leads to further surface roughening, with estimated root mean square roughness values of 40-50 nm. Spectroscopic ellipsometry analysis shows that the surface layer becomes thicker with increasing oxygen flow rate during film deposition. This layer is predominantly amorphous for as-deposited films, and predominantly crystalline after annealing. (C) 2003 Kluwer Academic Publishers.
|Item Type:||Conference Item (UNSPECIFIED)|
|Subjects:||T Technology > TK Electrical engineering. Electronics Nuclear engineering
T Technology > TA Engineering (General). Civil engineering (General)
Q Science > QC Physics
|Journal or Publication Title:||JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS|
|Publisher:||KLUWER ACADEMIC PUBL|
|Official Date:||October 2003|
|Number of Pages:||2|
|Page Range:||pp. 769-770|
|Title of Event:||12th International School on Condensed Matter Physics|
|Location of Event:||VARNA, BULGARIA|
|Date(s) of Event:||SEP 01-06, 2002|
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