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Valence band offset of the ZnO/AlN heterojunction determined by X-ray photoemission spectroscopy

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Veal, T. D. (Tim D.), King, Philip David, Hatfield, S. A., Bailey, L. R. (Laura R.), McConville, C. F. (Chris F.), Martel, B., Moreno, J. C., Frayssinet, E., Semond, F. and Zúñiga-Pérez, J.. (2008) Valence band offset of the ZnO/AlN heterojunction determined by X-ray photoemission spectroscopy. Applied Physics Letters, Vol.93 (No.20). p. 202108. ISSN 0003-6951

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Official URL: http://dx.doi.org/10.1063/1.3032911

Abstract

The valence band offset of ZnO/AlN heterojunctions is determined by high resolution x-ray photoemission spectroscopy. The valence band of ZnO is found to be 0.43±0.17 eV below that of AlN. Together with the resulting conduction band offset of 3.29±0.20 eV, this indicates that a type-II (staggered) band line up exists at the ZnO/AlN heterojunction. Using the III-nitride band offsets and the transitivity rule, the valence band offsets for ZnO/GaN and ZnO/InN heterojunctions are derived as 1.37 and 1.95 eV, respectively, significantly higher than the previously determined values.

Item Type: Journal Article
Subjects: Q Science > QC Physics
Divisions: Faculty of Science > Physics
Library of Congress Subject Headings (LCSH): Compound semiconductors, X-ray photoelectron spectroscopy, Heterojunctions, Conduction band, Zinc compounds, Aluminum compounds, Gallium compounds, indium compounds
Journal or Publication Title: Applied Physics Letters
Publisher: American Institute of Physics
ISSN: 0003-6951
Date: 20 November 2008
Volume: Vol.93
Number: No.20
Page Range: p. 202108
Identification Number: 10.1063/1.3032911
Status: Peer Reviewed
Access rights to Published version: Open Access
Funder: Engineering and Physical Sciences Research Council (EPSRC), France. Agence nationale de la recherche (ANR)
Grant number: EP/E010210/1 (EPSRC), EP/C535553/1 (EPSRC), EP/E025722/1 (EPSRC)
References: # Ü. Özgür, Y. I. Alivov, C. Liu, A. Teke, M. A. Reshchikov, S. Doğan, V. Avrutin, S. J. Cho, and H. Morkoç, J. Appl. Phys. 98, 041301 (2005). # M. Zamfirescu, A. Kavokin, B. Gil, G. Malpuech, and M. Kaliteevski, Phys. Rev. B 65, 161205 (2002). # M. Mihailovic, A. -L. Henneghien, S. Faure, P. Disseix, J. Leymarie, A. Vasson, D. A. Buell, F. Semond, C. Morhain, and J. Zuniga-Pérez, “Optical and excitonic properties of ZnO films,” Opt. Mater. (Amsterdam, Neth.) (to be published), doi:10.1016/j.optmat.2007.10.023. # J. Kasprzak, M. Richard, S. Kundermann, A. Baas, P. Jeambrun, J. M. J. Keeling, F. M. Marchetti, M. H. Szymańska, R. André, J. L. Staehli, V. Savona, P. B. Littlewood, B. Deveaud, and L. S. Dang, Nature (London) 443, 409 (2006). # A. Tsukazaki, A. Ohtomo, T. Onuma, M. Ohtani, T. Makino, M. Sumiya, K. Ohtani, S. F. Chichibu, S. Fuke, Y. Segawa, H. Ohno, H. Koinuma, and M. Kawasaki, Nature Mater. 4, 42 (2005). # Z. P. Wei, Y. M. Lu, D. Z. Shen, Z. Z. Zhang, B. Yao, B. H. Li, J. Zhang, D. X. Zhao, X. W. Fan, and Z. K. Tang, Appl. Phys. Lett. 90, 042113 (2007). # C. Bayram, F. Hosseini Teherani, D. J. Rogers, and M. Razeghi, Appl. Phys. Lett. 93, 081111 (2008). # J. Wu, W. Walukiewicz, K. M. Yu, W. Shan, J. W. Ager III, E. E. Haller, H. Lu, W. J. Schaff, W. K. Metzger, and S. Kurtz, J. Appl. Phys. 94, 6477 (2003a). # Y. A. Alivov, J. E. Van Nostrand, D. C. Look, M. V. Chukichev, and B. M. Ataev, Appl. Phys. Lett. 83, 2943 (2003). # D. J. Rogers, F. Hosseini Teherani, A. Yasan, K. Minder, P. Kung, and M. Razeghi, Appl. Phys. Lett. 88, 141918 (2006). # P. D. C. King, T. D. Veal, P. H. Jefferson, C. F. McConville, T. Wang, P. J. Parbrook, H. Lu, and W. J. Schaff, Appl. Phys. Lett. 90, 132105 (2007). # P. D. C. King, T. D. Veal, C. E. Kendrick, L. R. Bailey, S. M. Durbin, and C. F. McConville, Phys. Rev. B 78, 033308 (2008). # S. -H. Wei and A. Zunger, Appl. Phys. Lett. 69, 2719 (1996). # C. G. Van de Walle and J. Neugebauer, Appl. Phys. Lett. 70, 2577 (1997). # J. Robertson and B. Falabretti, J. Appl. Phys. 100, 014111 (2006). # W. Mönch, J. Appl. Phys. 80, 5076 (1996). # R. Zhang, P. Zhang, T. Kang, H. Fan, X. Liu, S. Yang, H. Wei, Q. Zhu, and Z. Wang, Appl. Phys. Lett. 91, 162104 (2007). # S. -K. Hong, T. Hanada, H. Makino, H. -J. Ko, Y. Chen, A. Tanaka, H. Saski, S. Sato, D. Imai, K. Araki, and M. Shinohara, J. Vac. Sci. Technol. B 19, 1429 (2001). # W. Mönch, Appl. Phys. Lett. 86, 162101 (2005). # J. von Pezold and P. D. Bristowe, J. Mater. Sci. 40, 3051 (2005). # M. W. Wang, J. O. McCaldin, J. F. Swenberg, T. C. McGill, and R. J. Hauenstein, Appl. Phys. Lett. 66, 1974 (1995). # F. Vigué, P. Vennéguès, C. Deparis, S. Vézian, M. Laügt, and J. -P. Faurie, J. Appl. Phys. 90, 5115 (2001). # F. Semond, Y. Cordier, N. Grandjean, F. Natali, B. Damilano, S. Vézian, and J. Massies, Phys. Status Solidi A 188, 501 (2001). # S. Tanuma, J. Powell, and D. R. Penn, Surf. Interface Anal. 21, 165 (1993). # P. D. C. King, T. D. Veal, H. Lu, S. A. Hatfield, W. J. Schaff, and C. F. McConville, Surf. Sci. 602, 871 (2008). # S. A. Chambers, T. Droubay, T. C. Kaspar, and M. Gutowski, J. Vac. Sci. Technol. B 22, 2205 (2004). # I. Vurgaftman and J. R. Meyer, J. Appl. Phys. 94, 3675 (2003). # S. -H. Wei and A. Zunger, Appl. Phys. Lett. 72, 2011 (1998). # L. Ley, R. A. Pollak, F. R. McFreely, S. P. Kowalczyk, and D. A. Shirley, Phys. Rev. B 9, 600 (1974). # P. D. C. King, T. D. Veal, C. F. McConville, F. Fuchs, J. Furthmüller, F. Bechstedt, J. Schörmann, D. J. As, K. Lischka, H. Lu, and W. J. Schaff, Phys. Rev. B 77, 115213 (2008). # J. Wu, W. Walukiewicz, W. Shan, K. M. Yu, J. W. Ager III, S. X. Li, E. E. Haller, H. Lu, and W. J. Schaff, J. Appl. Phys. 94, 4457 (2003).
URI: http://wrap.warwick.ac.uk/id/eprint/947

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