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The effect of film thickness on the gas sensing properties of ultra-thin TiO2 films deposited by atomic layer deposition
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Wilson, Rachel, Simion, Cristian, Blackman, Christopher, Carmalt, Claire, Stanoiu, Adelina, Di Maggio, Francesco and Covington, James A. (2018) The effect of film thickness on the gas sensing properties of ultra-thin TiO2 films deposited by atomic layer deposition. Sensors, 18 (3). 735. doi:10.3390/s18030735
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WRAP-effect-film-thickness-gas-sensing-properties-ultra-thin-TiO2-films-deposited-atomic-layer-Covington-2017.pdf - Published Version - Requires a PDF viewer. Available under License Creative Commons Attribution 4.0. Download (8Mb) | Preview |
Official URL: http://dx.doi.org/10.3390/s18030735
Abstract
Analyte sensitivity for gas sensors based on semiconducting metal oxides should be highly dependent on the film thickness, particularly when that thickness is on the order of the Debye length. This thickness dependence has previously been demonstrated for SnO2 and inferred for TiO2. In this paper, TiO2 thin films have been prepared by Atomic Layer Deposition (ALD) using titanium isopropoxide and water as precursors. The deposition process was performed on standard alumina gas sensor platforms and microscope slides (for analysis purposes), at a temperature of 200 °C. The TiO2 films were exposed to different concentrations of CO, CH4, NO2, NH3 and SO2 to evaluate their gas sensitivities. These experiments showed that the TiO2 film thickness played a dominant role within the conduction mechanism and the pattern of response for the electrical resistance towards CH4 and NH3 exposure indicated typical n-type semiconducting behavior. The effect of relative humidity on the gas sensitivity has also been demonstrated.
| Item Type: | Journal Article | |||||||||
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| Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering | |||||||||
| Divisions: | Faculty of Science > Engineering | |||||||||
| Library of Congress Subject Headings (LCSH): | Metal oxide semiconductors, Gas detectors -- Design and construction, Thin films, Atomic layer deposition, Titanium compounds | |||||||||
| Journal or Publication Title: | Sensors | |||||||||
| Publisher: | MDPI AG | |||||||||
| ISSN: | 1424-8220 | |||||||||
| Official Date: | 1 March 2018 | |||||||||
| Dates: |
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| Date of first compliant deposit: | 2 March 2018 | |||||||||
| Volume: | 18 | |||||||||
| Number: | 3 | |||||||||
| Article Number: | 735 | |||||||||
| DOI: | 10.3390/s18030735 | |||||||||
| Status: | Peer Reviewed | |||||||||
| Publication Status: | Published | |||||||||
| Access rights to Published version: | Open Access | |||||||||
| RIOXX Funder/Project Grant: |
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